COMPUTERIZED MONITORING SYSTEM FOR PARAMETERS OF ELECTRON BEAM PROCESSING OF OPTICAL COMPONENTS IN COMPUTER SYSTEMS

The developed computerized monitoring system for the parameters of electron beam processing of optical components represents a cutting-edge solution for ensuring precise real-time control of technological parameters. The system is based on a microprocessor control unit that integrates all components through a CAN bus and a high-voltage optical interface. The primary functions of the system include monitoring the voltage on the cathode and modulator, filament current, and electron beam parameters, as well as adjusting these parameters during the processing. Thanks to adaptive regulation, the system achieves stability in electron beam processing parameters, as evidenced by low voltage deviations (up to ±2%) and uniformity in thin-film coatings (up to ±5%). The use of the high-voltage optical interface minimizes signal loss and enhances data transmission accuracy. The system easily integrates with computer systems via a USB interface, providing the ability to connect additional sensors to expand its functionality. The results of the system's testing, conducted on the UVN-71 electron beam processing unit, demonstrated significant advantages. It reduces surface defects, improves processing uniformity, and minimizes optical material losses. This solution is critically important for the production of high-quality optical components used in modern computer systems, ensuring compliance with the strictest quality standards. Thus, the developed computerized monitoring system facilitates the optimization of electron beam processes, enhancing productivity and product quality while unlocking new opportunities for the optical components industry.