Current and Gate Capacitance Models of Amorphous InGaZnO Transistors With Double-Layer Electrolytic Gate Insulation

Electrolytic double-layer gate insulation transistors (EDLGITs) have gained significant attention recently due to their features for achieving high-density charge accumulation and low operating voltage. This is primarily attributed to the large capacitance of the electrolyte insulation in these devices. This article proposes a physical model for the capacitance of the electrolytic double-layer gate insulation (EDLGI) and the drain current of amorphous InGaZnO (a-IGZO) EDLGITs based on the channel surface potential. It is demonstrated that the EDLGI capacitance, which comprises the compact-layer and diffuse-layer capacitances, is not only influenced by the characteristics of the electrolyte but also by the gate voltage. Furthermore, the frequency-dependent equivalent capacitance of the electrolyte insulation (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${C} _{\text {eq}}$ </tex-math></inline-formula>) under ac gate voltage in a-IGZO EDLGITs is analyzed. The drain current and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${C} _{\text {eq}}$ </tex-math></inline-formula> calculated using our model show good consistency with the reported experimental data.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-12-27
DOI
https://doi.org/10.1109/ted.2024.3505140
Citations
2
Primary Topic
Thin-Film Transistor Technologies
Type
article
Field-Weighted Citation Impact
0.42

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article

Current and Gate Capacitance Models of Amorphous InGaZnO Transistors With Double-Layer Electrolytic Gate Insulation

Exian Liu, Qingyu Zeng, Meng Wang, Zhengping Shan et al.
2 citations
IEEE Transactions on Electron Devices
Thin-Film Transistor Technologies
0.42
article

Current and Gate Capacitance Models of Amorphous InGaZnO Transistors With Double-Layer Electrolytic Gate Insulation

Exian Liu, Qingyu Zeng, Meng Wang, Zhengping Shan, Gen-Hua Liu, Minxi Cai, Piao-Rong Xu, Lu Wang
article en
2 citations

Abstract

Electrolytic double-layer gate insulation transistors (EDLGITs) have gained significant attention recently due to their features for achieving high-density charge accumulation and low operating voltage. This is primarily attributed to the large capacitance of the electrolyte insulation in these devices. This article proposes a physical model for the capacitance of the electrolytic double-layer gate insulation (EDLGI) and the drain current of amorphous InGaZnO (a-IGZO) EDLGITs based on the channel surface potential. It is demonstrated that the EDLGI capacitance, which comprises the compact-layer and diffuse-layer capacitances, is not only influenced by the characteristics of the electrolyte but also by the gate voltage. Furthermore, the frequency-dependent equivalent capacitance of the electrolyte insulation (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${C} _{\text {eq}}$ </tex-math></inline-formula>) under ac gate voltage in a-IGZO EDLGITs is analyzed. The drain current and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${C} _{\text {eq}}$ </tex-math></inline-formula> calculated using our model show good consistency with the reported experimental data.

IEEE Transactions on Electron DevicesVol. 72(2)
Central South University of Forestry and Technology (CN), Central South University (CN), Hunan University of Arts and Science (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 36%
Thin-Film Transistor Technologies
0.42
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