Current and Gate Capacitance Models of Amorphous InGaZnO Transistors With Double-Layer Electrolytic Gate Insulation
Electrolytic double-layer gate insulation transistors (EDLGITs) have gained significant attention recently due to their features for achieving high-density charge accumulation and low operating voltage. This is primarily attributed to the large capacitance of the electrolyte insulation in these devices. This article proposes a physical model for the capacitance of the electrolytic double-layer gate insulation (EDLGI) and the drain current of amorphous InGaZnO (a-IGZO) EDLGITs based on the channel surface potential. It is demonstrated that the EDLGI capacitance, which comprises the compact-layer and diffuse-layer capacitances, is not only influenced by the characteristics of the electrolyte but also by the gate voltage. Furthermore, the frequency-dependent equivalent capacitance of the electrolyte insulation (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${C} _{\text {eq}}$ </tex-math></inline-formula>) under ac gate voltage in a-IGZO EDLGITs is analyzed. The drain current and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${C} _{\text {eq}}$ </tex-math></inline-formula> calculated using our model show good consistency with the reported experimental data.
Authors
- Exian Liu (ORCID: https://orcid.org/0000-0002-1031-7891)
- Qingyu Zeng (ORCID: https://orcid.org/0000-0001-8554-7635)
- Meng Wang (ORCID: https://orcid.org/0000-0002-5393-0418)
- Zhengping Shan
- Gen-Hua Liu
- Minxi Cai (ORCID: https://orcid.org/0000-0001-5307-7341)
- Piao-Rong Xu
- Lu Wang (ORCID: https://orcid.org/0000-0001-9833-7450)
Institutions
- Central South University of Forestry and Technology (CN)
- Central South University (CN)
- Hunan University of Arts and Science (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2024-12-27
- DOI
- https://doi.org/10.1109/ted.2024.3505140
- Citations
- 2
- Primary Topic
- Thin-Film Transistor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.42
Funders
- National Natural Science Foundation of China