Process and Design Considerations for Spin Orbit Torque MRAM
Spin-orbit torque magnetic random access memory (SOT-MRAM) is widely recognized as a promising candidate for the next generation of high-performance nonvolatile memory solutions. Although characterized by its ultrafast operation speed and exceptional reliability, SOTMRAM presents significant challenges in fabrication process and circuit design due to its three-terminal topology and toppinned nano-pillar stack structure. In this invited paper, we provide a review of our recent advancements in the development of SOT-MRAM. Key issues concerning the process and design of SOT-MRAM are thoroughly discussed, meanwhile detailed optimization strategies and improvements are presented.
Authors
- Zhaohao Wang
- Chenyi Wang (ORCID: https://orcid.org/0000-0003-3003-2225)
- Hongxi Liu (ORCID: https://orcid.org/0000-0002-6300-8582)
- Min Wang (ORCID: https://orcid.org/0000-0003-1391-8999)
- Yunpeng Li (ORCID: https://orcid.org/0000-0002-9663-5435)
- Chao Wang (ORCID: https://orcid.org/0000-0003-2737-4048)
- Cong Zhang (ORCID: https://orcid.org/0000-0001-9220-1106)
- Chunjiang Xu (ORCID: https://orcid.org/0009-0004-1889-9437)
- Kaihua Cao (ORCID: https://orcid.org/0000-0002-5060-4465)
Institutions
- Beihang University (CN)
Publication Details
- Published
- 2024-11-07
- DOI
- https://doi.org/10.1109/apccas62602.2024.10808875
- Citations
- 1
- Primary Topic
- Advanced Surface Polishing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.18