Mechanically robust, highly toughened, corrosion and impact resistant epoxy/silica nanocomposites by UV curing 3D printing technology
In this paper, a photosensitive resin was successfully synthesized using epoxy as a matrix and the effect of nanosilica on its properties was investigated. Micromorphology analyses show that the nanosilica has good dispersion and strong interaction with the matrix. Additionally, a finite element model was developed to predict the tensile performance of the nanocomposite under high-strain loads. Molecular dynamics simulations demonstrated a favorable binding energy between nanosilica and epoxy resin. The effects of nanosilica on the fracture toughness and energy release rate of photosensitive resins were investigated using load-enhanced tensile test method. The results showed that the addition of 1.0 wt.% nanosilica particles increased the toughness of the resin from 0.45 MPa m<sup>1/2</sup> to 0.79 MPa m<sup>1/2</sup>, and the energy release rate from 248.3 J/m<sup>2</sup> to 555.7 J/m<sup>2</sup>; compared with the neat photosensitive resins, the incorporation of nanosilica increased the tensile and impact strengths of the resins by 26.8% and 49.2%, respectively. The nanosilica was used to improve the tensile strength and impact strength of the resin by 26.8% and 49.2% respectively compared with the neat photosensitive resin. Electrochemical corrosion analysis showed that the photosensitive resin/nanosilica composites have excellent corrosion resistance. Under different corrosion environments of acid, alkali, and salt, the addition of 1 wt.% nanosilica in the photosensitive resin composite led to an increase in corrosion voltage by 0.023 V, 0.004 V, and 0.1 V respectively compared to neat photosensitive resin. Additionally, the corrosion current density decreased by 1.39 × 10<sup>−6</sup> A/cm<sup>2</sup>, 0.525 × 10<sup>−4</sup> A/cm<sup>2</sup>, and 2.57 × 10<sup>−6</sup> A/cm<sup>2</sup>, respectively. On this basis, the independently synthesised photosensitive resin has excellent strength and 0.01 mm printing accuracy.
Authors
- Sensen Han (ORCID: https://orcid.org/0000-0002-2429-9006)
- Tianqing Liu (ORCID: https://orcid.org/0000-0002-9058-2643)
- Yin Yu (ORCID: https://orcid.org/0000-0002-0381-1437)
- Qingshi Meng (ORCID: https://orcid.org/0000-0002-8187-7028)
- Kangbo Zhao (ORCID: https://orcid.org/0009-0001-9274-2284)
- Xuefeng Sun
- Rui Cai (ORCID: https://orcid.org/0000-0002-9610-9363)
- Changbao Zhao
- Yufeng Chen (ORCID: https://orcid.org/0000-0003-2970-352X)
Institutions
- Shenyang Aerospace University (CN)
- Westmead Institute (AU)
- Shenyang University (CN)
- Western Sydney University (AU)
- Coventry University (GB)
- Universidad del Noreste (MX)
- Northeastern University (CN)
Publication Details
- Journal
- Advanced Composite Materials
- Published
- 2024-12-26
- DOI
- https://doi.org/10.1080/09243046.2024.2447146
- Citations
- 2
- Primary Topic
- Photopolymerization techniques and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.50
Funders
- National Natural Science Foundation of China