A Co-Blended and Compounded Photosensitive Resin with Improved Mechanical Properties and Thermal Stability for Nail Polish Application

UV-curable bio-based resins are widely used in the UV curing field. However, the current UV-curable bio-based resins for the application of nail polish still have the problems of too high viscosity and insufficiently excellent mechanical properties. In this study, a soybean oil-based acrylate photosensitive resin is synthesized by using epoxidized soybean oil as a raw material and reacting it with acrylic acid. The results show that the viscosity of soybean oil-based acrylate can achieve 8.31 Pa∙s, and the UV-cured film prepared by soybean oil-based acrylate and anhydride derivatives can obtain a tensile strength of 35.36 MPa and an elongation at break of 67.8%. In addition, the soybean oil-based acrylate is further reacted with isophorone diisocyanate to obtain soybean oil-based polyurethane acrylate, which can be thermally stable at 90 °C for 7 d. And then, the UV-cured film constructed by soybean oil-based polyurethane acrylate and anhydride derivatives are prepared, and the elongation at the break of the cured films can be up to 320%. This work provides a solvent-free approach by using biomass raw materials to form polyurethane acrylic resins, which have promising potential in the application of nail polish.

Authors

Institutions

Publication Details

Journal
Polymers
Published
2024-12-27
DOI
https://doi.org/10.3390/polym17010040
Citations
3
Primary Topic
Laser Material Processing Techniques
Type
article
Field-Weighted Citation Impact
1.12

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

A Co-Blended and Compounded Photosensitive Resin with Improved Mechanical Properties and Thermal Stability for Nail Polish Application

Shengsen Wang, Shuangjiu Feng, Zhuohong Yang, Yang Hu et al.
3 citations
Polymers
Laser Material Processing Techniques
1.12
article

A Co-Blended and Compounded Photosensitive Resin with Improved Mechanical Properties and Thermal Stability for Nail Polish Application

Shengsen Wang, Shuangjiu Feng, Zhuohong Yang, Yang Hu, Yingzi Huang, Zhihong Chen
article en
3 citations

Abstract

UV-curable bio-based resins are widely used in the UV curing field. However, the current UV-curable bio-based resins for the application of nail polish still have the problems of too high viscosity and insufficiently excellent mechanical properties. In this study, a soybean oil-based acrylate photosensitive resin is synthesized by using epoxidized soybean oil as a raw material and reacting it with acrylic acid. The results show that the viscosity of soybean oil-based acrylate can achieve 8.31 Pa∙s, and the UV-cured film prepared by soybean oil-based acrylate and anhydride derivatives can obtain a tensile strength of 35.36 MPa and an elongation at break of 67.8%. In addition, the soybean oil-based acrylate is further reacted with isophorone diisocyanate to obtain soybean oil-based polyurethane acrylate, which can be thermally stable at 90 °C for 7 d. And then, the UV-cured film constructed by soybean oil-based polyurethane acrylate and anhydride derivatives are prepared, and the elongation at the break of the cured films can be up to 320%. This work provides a solvent-free approach by using biomass raw materials to form polyurethane acrylic resins, which have promising potential in the application of nail polish.

PolymersVol. 17(1)
South China Agricultural University (CN)
Basic and Applied Basic Research Foundation of Guangdong Province
Openalex Percentile: Top 24%
Laser Material Processing Techniques
1.12
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.