A Method for Preparing Gallium-nickel Alloy Solid Targets by Alternating Current Plating

In this paper, an alternating current electroplating platform is built. Gallium-nickel alloy plating is prepared on copper targets by using alternating current electroplating methods. The mixed solution of gallium and nickel metal ions is used as the electroplating solution. The differences of gallium-nickel alloy targets prepared by alternating current plating under different conditions of temperature, current density and pH of the plating solution were investigated, and a set of electroplating conditions for gallium-nickel alloy targets prepared by AC electroplating platform were summarized in this article. It is concluded that the gallium-nickel alloy coating with excellent surface quality can be obtained under the conditions of the temperature of the plating solution below 80℃, the current density of 25-50 mA/cm2 and the pH of the plating solution of 1.75-2.25 by the analysis of a series of experimental results. At the same time, it seems that the quality of gallium-nickel alloy coating obtained by AC plating is better than that of DC plating under the same conditions through the characterization results. Therefore, the scheme of using an AC electroplating platform to prepare gallium-nickel alloy targets is feasible.