A New Method for Producing Amorphous Silicon Films with a Fano Resonance
We report on a new method for producing amorphous silicon in which a Fano resonance is observed. The method involves treating a porous silicon film doped with boron with pulsed laser radiation. The results of studying the fabricated amorphous silicon films using Raman spectroscopy are presented.
Authors
- В. В. Трегулов
- Н. В. Рыбина (ORCID: https://orcid.org/0000-0003-0377-5605)
- N. B. Rybin (ORCID: https://orcid.org/0000-0003-2000-0158)
- N. N. Melnik (ORCID: https://orcid.org/0000-0002-7058-0333)
- D. S. Kostsov
- V. S. Khilov
Institutions
- P.N. Lebedev Physical Institute of the Russian Academy of Sciences (RU)
- Ryazan State University (RU)
- Ryazan State Radio Engineering University (RU)
Publication Details
- Journal
- Bulletin of the Lebedev Physics Institute
- Published
- 2024-11-01
- DOI
- https://doi.org/10.3103/s1068335624600785
- Citations
- 1
- Primary Topic
- Photonic Crystals and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.34