Electronic Assessment of Novel Nanosheet RFET With Dual-Doped Source/Drain

To overcome the limitation of lower on-current in conventional Schottky barrier reconfigurable field-effect transistors (SB-RFETs) with metal source/drain, a novel nanosheet reconfigurable field-effect transistor (RFET) with dual-doped source/drain (DD-RFET) is proposed in this work for the first time. Compared to the conventional SB-RFET, the on-state current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {on}}$ </tex-math></inline-formula> improves by <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$61.4\times $ </tex-math></inline-formula> for n-type program and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$42.8\times $ </tex-math></inline-formula> for p-type program, respectively. The thermal carrier emission instead of Schottky tunneling is demonstrated to contribute for the improved driven current in the proposed DD-RFET. The impact of geometric sizes and materials, such as control-gate length (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${L}_{\text {CG}}$ </tex-math></inline-formula>), program gate length (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${L}_{\text {PG}}$ </tex-math></inline-formula>), and spacer dielectric constant (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${K}_{\text {SP}}$ </tex-math></inline-formula>), is investigated in detail. The key metrics, including on-state current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {on}}$ </tex-math></inline-formula>, off-sate current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {off}}$ </tex-math></inline-formula>, maximum of transconductance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {g}_{\max }$ </tex-math></inline-formula>, and intrinsic delay <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {d}}$ </tex-math></inline-formula>, are used to evaluate the performance during optimization. This article provides solutions for RFET in high-performance applications.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-12-25
DOI
https://doi.org/10.1109/ted.2024.3514828
Citations
4
Primary Topic
Integrated Circuits and Semiconductor Failure Analysis
Type
article
Field-Weighted Citation Impact
0.83

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article

Electronic Assessment of Novel Nanosheet RFET With Dual-Doped Source/Drain

Yabin Sun, Yanling Shi, Xiaojin Li, Jianing Zhang et al.
4 citations
IEEE Transactions on Electron Devices
Integrated Circuits and Semiconductor Failure Analysis
0.83
article

Electronic Assessment of Novel Nanosheet RFET With Dual-Doped Source/Drain

Yabin Sun, Yanling Shi, Xiaojin Li, Jianing Zhang, Ziyu Liu
article en
4 citations

Abstract

To overcome the limitation of lower on-current in conventional Schottky barrier reconfigurable field-effect transistors (SB-RFETs) with metal source/drain, a novel nanosheet reconfigurable field-effect transistor (RFET) with dual-doped source/drain (DD-RFET) is proposed in this work for the first time. Compared to the conventional SB-RFET, the on-state current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {on}}$ </tex-math></inline-formula> improves by <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$61.4\times $ </tex-math></inline-formula> for n-type program and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$42.8\times $ </tex-math></inline-formula> for p-type program, respectively. The thermal carrier emission instead of Schottky tunneling is demonstrated to contribute for the improved driven current in the proposed DD-RFET. The impact of geometric sizes and materials, such as control-gate length (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${L}_{\text {CG}}$ </tex-math></inline-formula>), program gate length (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${L}_{\text {PG}}$ </tex-math></inline-formula>), and spacer dielectric constant (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${K}_{\text {SP}}$ </tex-math></inline-formula>), is investigated in detail. The key metrics, including on-state current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {on}}$ </tex-math></inline-formula>, off-sate current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {off}}$ </tex-math></inline-formula>, maximum of transconductance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {g}_{\max }$ </tex-math></inline-formula>, and intrinsic delay <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {d}}$ </tex-math></inline-formula>, are used to evaluate the performance during optimization. This article provides solutions for RFET in high-performance applications.

IEEE Transactions on Electron DevicesVol. 72(2)
Fudan University (CN), Shanghai Fudan Microelectronics (China) (CN), East China Normal University (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 26%
Integrated Circuits and Semiconductor Failure Analysis
0.83
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