Adjustment of Abrupt Drops in the C-V Curves of Various 4H-SiC MOSFETs and JBS Diodes
This study demonstrates the corresponding voltages to the abrupt drops in the C-V curves of the planar metal-oxide-semiconductor field-effect transistors (MOSFETs) and junction barrier Schottky (JBS) diodes without the P-pillar can be adjusted by designing the concentrations and structures of P-type regions, N-type junction field-effect transistor (JFET) regions, and N-type drift regions. When the concentrations of the upper N-type regions are much higher than those of the lower N-type regions and the widths are narrower than those of the N-type region beneath, both the C-V curves of MOSFETs and JBS show abrupt drops. From the measured results, the abrupt drop of the JBS becomes relatively steep and obvious when the concentration of the upper N-type region is 5 times higher than that of the lower N-type region in this study. The simulation results of the MOSFETs with multiple (equal to or more than 3) P- and N-type regions also demonstrate the multiple abrupt drops in the C-V curve under the above-mentioned conditions. The critical values of the concentrations and widths are decided in this study only. Additionally, the measured and simulated switching waveforms show when the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\textit {ds}}$ </tex-math></inline-formula> corresponding to the abrupt drop decreases, the reverse recovery time (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${t}_{\textit {rr}}\text {)}$ </tex-math></inline-formula> is shortened, and turn-on energy loss (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${E}_{\textit {on}}\text {)}$ </tex-math></inline-formula> may be reduced.
Authors
- Kung‐Yen Lee (ORCID: https://orcid.org/0000-0003-2590-0702)
- Ruei-Ci Wu
- Pei‐Chun Liao
Institutions
- National Taiwan Ocean University (TW)
- National Taiwan University of Science and Technology (TW)
- National Taiwan University (TW)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2024-12-25
- DOI
- https://doi.org/10.1109/led.2024.3522278
- Citations
- 2
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.42
Funders
- National Science and Technology Council