Measurement of electron density in high-pressure plasma using a microwave cutoff probe

Despite the widespread applications of high-pressure plasma in semiconductor and display industry, such as deposition and ashing process, the use of cutoff probes for diagnosing high-pressure plasma was rarely studied. In this study, we investigated a method of measuring electron density in a cutoff probe using the resonance peak in a high-pressure plasma environment. This method is validated through both electromagnetic wave simulations and experimental methodologies. Our findings reveal that the proposed method demonstrates discrepancies of less than 1.47% compared to the input plasma frequency in the results of electromagnetic wave simulations at a gas pressure of 10 mTorr, while at 2.5 Torr, it exhibited a maximum discrepancy of 13.3% when selecting resonance frequencies lower than the electron–neutral collision frequency. This discrepancy at high pressure is reduced to within 1.92% by selecting a resonance frequency higher than the electron–neutral collision frequency. Also, the feasibility of these electron density measurements has been confirmed under conditions of high gas pressure where the cutoff frequency is not measurable, as evidenced by both simulation and experimental results. Our research on the diagnostic methods in high-pressure plasmas could significantly enhance the measurement and interpretation of plasma parameters in various industrial processes.