Polymer Films’ Residual Stress Attenuation from the Supramolecular Complexation with Ultra‐Small Nanoparticles for High Resolution Nanoimprint Lithography

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Publication Details

Journal
Angewandte Chemie
Published
2024-12-23
DOI
https://doi.org/10.1002/ange.202416759
Citations
1
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
Field-Weighted Citation Impact
0.18

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article

Polymer Films’ Residual Stress Attenuation from the Supramolecular Complexation with Ultra‐Small Nanoparticles for High Resolution Nanoimprint Lithography

Bin Wang, Binghui Xue, Panchao Yin, Qiang Yu et al.
1 citations
Angewandte Chemie
Nanofabrication and Lithography Techniques
0.18
article

Polymer Films’ Residual Stress Attenuation from the Supramolecular Complexation with Ultra‐Small Nanoparticles for High Resolution Nanoimprint Lithography

Bin Wang, Binghui Xue, Panchao Yin, Qiang Yu, Shenglin Yao, Jiadong Chen
article en
1 citations

Abstract

No abstract available for this paper.
Angewandte ChemieVol. 137(5)
South China University of Technology (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 49%
Nanofabrication and Lithography Techniques
0.18
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