Polymer Films’ Residual Stress Attenuation from the Supramolecular Complexation with Ultra‐Small Nanoparticles for High Resolution Nanoimprint Lithography
Authors
Bin Wang (ORCID: https://orcid.org/0000-0002-8114-7236)
Polymer Films’ Residual Stress Attenuation from the Supramolecular Complexation with Ultra‐Small Nanoparticles for High Resolution Nanoimprint Lithography
Bin Wang, Binghui Xue, Panchao Yin, Qiang Yu et al.
Citations
1 citations
Journal
Angewandte Chemie
Topics
Nanofabrication and Lithography Techniques
Field-Weighted Citation Impact (FWCI)
0.18
article
Polymer Films’ Residual Stress Attenuation from the Supramolecular Complexation with Ultra‐Small Nanoparticles for High Resolution Nanoimprint Lithography