Ultra-thin and thin CrSi films on Si(111): I. Formation and crystal structure
In this paper we present the results of ab initio calculations on the ground state of the CrSi bulk and experimental studies on the structure and morphology of thin and ultrathin CrSi films grown on Si(111) substrates.
Authors
- Natalia V. Skorodumova (ORCID: https://orcid.org/0000-0001-6417-5844)
- S. A. Dotsenko (ORCID: https://orcid.org/0000-0002-0052-7465)
- Д. Б. Мигас (ORCID: https://orcid.org/0000-0003-3004-7996)
- А.В. Герасименко (ORCID: https://orcid.org/0000-0003-2929-8472)
- Oleg V. Kropachev (ORCID: https://orcid.org/0000-0003-4300-0070)
- Konstantin N. Galkin (ORCID: https://orcid.org/0000-0001-5386-1013)
- N. G. Galkin (ORCID: https://orcid.org/0000-0003-4127-2988)
- А. К. Гутаковский (ORCID: https://orcid.org/0000-0002-4712-8736)
- D. L. Goroshko (ORCID: https://orcid.org/0000-0002-1250-3372)
- А. Б. Филонов (ORCID: https://orcid.org/0009-0001-3584-4567)
Institutions
- Luleå University of Technology (SE)
- Institute of Chemistry, Far Eastern Branch of the Russian Academy of Sciences (RU)
- Institute of Automation and Control Processes (RU)
- Institute of Semiconductor Physics (RU)
- Far Eastern Branch of the Russian Academy of Sciences (RU)
- Belarusian State University of Informatics and Radioelectronics (BY)
- National Research Nuclear University MEPhI (RU)
Publication Details
- Journal
- Journal of Materials Chemistry C
- Published
- 2024-12-23
- DOI
- https://doi.org/10.1039/d4tc03122a
- Citations
- 4
- Primary Topic
- Semiconductor materials and interfaces
- Type
- article
- Field-Weighted Citation Impact
- 1.35
Funders
- Vetenskapsrådet
- Russian Science Foundation
- National Research Nuclear University MEPhI