Towards an Enhanced Metrology Analysis Procedure for Assessing Position Accuracy of Edge-Emitting Lasers to Photonic Integrated Circuits
Advanced photonic integrated systems require precise light source coupling, especially with edge-emitting lasers. This paper discusses how passive 2D alignment achieves below-micron accuracy. It introduces a metrology procedure for consistent analysis of the positioning process in manufacturing, ensuring optimal performance and reliable failure analysis.
Authors
- Alexander Bergmann (ORCID: https://orcid.org/0000-0003-3343-8319)
- Jakob W. Hinum-Wagner (ORCID: https://orcid.org/0000-0003-1407-4847)
- Samuel M. Hörmann (ORCID: https://orcid.org/0000-0003-0517-5486)
- Gandolf Feigl
- V. Sidorov
- Jochen Kraft
Institutions
- AMS (Austria) (AT)
- Graz University of Technology (AT)
Publication Details
- Published
- 2024-11-10
- DOI
- https://doi.org/10.1109/ipc60965.2024.10799691
- Primary Topic
- Semiconductor Lasers and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00