Lithium Niobate on Insulator Technology for applications in the 1064 nm Window
Thin film lithium niobate (TFLN) enables a high-performance integration platform thanks to its superior electro-optic properties and broad transparency range. In this contribution, we discuss preliminary results toward the exploitation of TFLN in the 1064nm window, further enhancing its versatility for telecommunications and sensing applications.
Authors
- Nicola Andriolli (ORCID: https://orcid.org/0000-0001-8322-6854)
- G. Contestabile (ORCID: https://orcid.org/0000-0001-8703-3291)
- P. S. Kincaid
- Lorenzo De Marinis (ORCID: https://orcid.org/0000-0003-1462-3199)
Institutions
- University of Pisa (IT)
- Scuola Superiore Sant'Anna (IT)
Publication Details
- Published
- 2024-11-10
- DOI
- https://doi.org/10.1109/ipc60965.2024.10799907
- Citations
- 3
- Primary Topic
- 3D IC and TSV technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.63