Exceptionally Low Optical Absorption in Aluminum Nitride Thin Films Deposited by Magnetron Sputtering
AlN addresses issues with traditional thin-film waveguides with its wide-bandgap and broad transparency window. This work demonstrates sputter-deposited AlN thin flms with ultra-low optical absorption, optimized via substrate and sputtering conditions. High-temperature deposition reduced oxygen content, improving transparency. Optical-loss measurements on waveguides confirmed record-low losses.
Authors
- Stephan Suckow (ORCID: https://orcid.org/0000-0002-1116-169X)
- Mohit Raghuwanshi (ORCID: https://orcid.org/0000-0003-4352-072X)
- Max C. Lemme (ORCID: https://orcid.org/0000-0003-4552-2411)
- Ravindra Singh (ORCID: https://orcid.org/0000-0002-9585-9736)
- Balasubramanian Sundarapandian (ORCID: https://orcid.org/0000-0002-1898-1527)
- T. Rijil
Institutions
- Fraunhofer Institute for Applied Solid State Physics (DE)
- AMO (Germany) (DE)
Publication Details
- Published
- 2024-11-10
- DOI
- https://doi.org/10.1109/ipc60965.2024.10799525
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00