Ultra-Low Loss Alumina and Silicon Nitride Waveguides in the Blue Through Multipass Lithography
High surface scattering loss is a major hindrance for low-loss integrated platforms at visible wavelengths. By optimizing our e-beam lithography process through a multi-pass technique, we achieve loss of 4.9 and 0.8 dB/cm at 450 nm in highly confining silicon nitride and alumina waveguides respectively.
Authors
- Natale G. Pruiti (ORCID: https://orcid.org/0000-0001-6703-1379)
- P. Reynolds (ORCID: https://orcid.org/0000-0001-7614-0008)
- Marc Sorel (ORCID: https://orcid.org/0000-0001-8365-4496)
- E.L. McKay
Institutions
- University of Glasgow (GB)
Publication Details
- Published
- 2024-11-10
- DOI
- https://doi.org/10.1109/ipc60965.2024.10799842
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00