Monolithically Integrated Two-Stage GaN Gate Drivers

This work presents the design, characterization, and optimization of a monolithically integrated two-stage GaN gate driver. The individually combinable stages provide a high degree of flexibility and can realize different driver topologies. The driver is also optionally manufactured with pad over active layout. Two driver supply concepts can be implemented and evaluated. Dynamic and static on-wafer measurements are shown. Optimization of the driver is performed for various design goals such as power consumption, rise/fall time and delay time. Finally, the results are discussed in detail.

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Publication Details

Published
2024-09-16
DOI
https://doi.org/10.1109/wipdaeurope62087.2024.10797450
Primary Topic
Semiconductor materials and devices
Type
article
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article

Monolithically Integrated Two-Stage GaN Gate Drivers

Michael Basler, Fouad Benkhelifa, R. Quay, Richard Reiner et al.
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Semiconductor materials and devices
article

Monolithically Integrated Two-Stage GaN Gate Drivers

Michael Basler, Fouad Benkhelifa, R. Quay, Richard Reiner, Stefan Mönch, Daniel Grieshaber
article en

Abstract

This work presents the design, characterization, and optimization of a monolithically integrated two-stage GaN gate driver. The individually combinable stages provide a high degree of flexibility and can realize different driver topologies. The driver is also optionally manufactured with pad over active layout. Two driver supply concepts can be implemented and evaluated. Dynamic and static on-wafer measurements are shown. Optimization of the driver is performed for various design goals such as power consumption, rise/fall time and delay time. Finally, the results are discussed in detail.

Fraunhofer Institute for Applied Solid State Physics (DE)
Sustainable cities and communities
Openalex Percentile: Top 78%
Semiconductor materials and devices
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