Steady-State Analysis of Standalone Vertical Silicon & SiC NPN BJTs

SiC BJTs have enabled a significant increase in the DC current gain compared with their Silicon counterparts. The absence of the gate oxide, as a known reliability concern in <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$S$</tex>iC MOSFETs, has enabled high-gain <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$S$</tex>iC BJTs to find popularity in certain applications. This paper has investigated the temperature-dependance of vertical high voltage NPN Silicon and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$S$</tex>iC BJTs and sheds light on the similarities and differences in static analysis. Measurements are conducted on key electrical properties: Transfer characteristics, Base-Emitter leakage Cur-rent <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(I_{R(BE)})$</tex>, Collector-Emitter on-resistance <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(\boldsymbol{R}_{on})$</tex>, DC common-Emitter current gain <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(\beta)$</tex> and Output (I-V) characteristics.

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Published
2024-09-16
DOI
https://doi.org/10.1109/wipdaeurope62087.2024.10797297
Citations
1
Primary Topic
Silicon Carbide Semiconductor Technologies
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article
Field-Weighted Citation Impact
0.21

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article

Steady-State Analysis of Standalone Vertical Silicon & SiC NPN BJTs

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1 citations
Silicon Carbide Semiconductor Technologies
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article

Steady-State Analysis of Standalone Vertical Silicon & SiC NPN BJTs

Saeed Jahdi, Phil Mellor, Ingo Lüdtke, Konstantinos Floros, Mana Hosseinzadehlish, Chengjun Shen
article en
1 citations

Abstract

SiC BJTs have enabled a significant increase in the DC current gain compared with their Silicon counterparts. The absence of the gate oxide, as a known reliability concern in <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$S$</tex>iC MOSFETs, has enabled high-gain <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$S$</tex>iC BJTs to find popularity in certain applications. This paper has investigated the temperature-dependance of vertical high voltage NPN Silicon and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$S$</tex>iC BJTs and sheds light on the similarities and differences in static analysis. Measurements are conducted on key electrical properties: Transfer characteristics, Base-Emitter leakage Cur-rent <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(I_{R(BE)})$</tex>, Collector-Emitter on-resistance <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(\boldsymbol{R}_{on})$</tex>, DC common-Emitter current gain <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(\beta)$</tex> and Output (I-V) characteristics.

University of Bristol (GB)
Engineering and Physical Sciences Research Council
Industry, innovation and infrastructure
Openalex Percentile: Top 45%
Silicon Carbide Semiconductor Technologies
0.21
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