Fully-Vertical GaN-on-SiC Trench MOSFETs
This letter presents the first demonstration of fully-vertical GaN-on-SiC trench MOSFETs enabled by a conductive AlGaN buffer. Good ON-state device performance including a maximum drain current density of 2.43 kA/cm2 and a high threshold voltage of 5 V has been demonstrated. The relatively high specific ON-resistance at low <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${\boldsymbol {V}}_{\text {DS}}$ </tex-math></inline-formula> is a result of a knee voltage induced by the yet to be optimized AlGaN/SiC heterojunction. A breakdown voltage of 334 V has been measured. Compared with quasi-vertical GaN-on-silicon trench MOSFETs, less current crowding effect is observed for fully-vertical GaN-on-SiC trench MOSFETs, as well as a better performance at elevated temperatures.
Authors
- Renqiang Zhu (ORCID: https://orcid.org/0000-0002-2456-2855)
- Kei May Lau (ORCID: https://orcid.org/0000-0002-7713-1928)
- Ka Ming Wong (ORCID: https://orcid.org/0000-0003-3770-1380)
- Jialun Li (ORCID: https://orcid.org/0000-0002-9709-9240)
Institutions
- Hong Kong University of Science and Technology (HK)
- University of Hong Kong (HK)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2024-12-19
- DOI
- https://doi.org/10.1109/led.2024.3520200
- Citations
- 7
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 2.18