Enhanced reliability of ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> capacitors by bottom electrode surface oxidation
Abstract We demonstrate that ozone oxidation of the bottom TiN electrode surface in Hf 0.5 Zr 0.5 O 2 (HZO) ferroelectric capacitors enhances dielectric-breakdown (DB) lifetime and endurance. Time-dependent-dielectric-breakdown measurements and Weibull analysis reveal the crystalline states in HZO on the oxidized bottom electrode surface influence on DB lifetime. First-order reversal curve analysis shows uniform polarization reversal voltage with oxidation. Grazing incidence X-ray diffraction indicates significant changes in crystallographic orientation, while X-ray photoelectron emission spectroscopy reveals minimal changes in interfacial chemical bonding states. This ozone oxidation forms a chemically uniform interfacial layer on the bottom electrode, promoting out-of-plane aligned crystallization, thus mitigating weak breakdown points for DB and endurance fatigue.
Authors
- Takuya Saraya (ORCID: https://orcid.org/0000-0002-3796-7747)
- Yuki Itoya (ORCID: https://orcid.org/0009-0001-9105-5407)
- Masaharu Kobayashi (ORCID: https://orcid.org/0000-0002-7945-6136)
- Toshiro Hiramoto (ORCID: https://orcid.org/0000-0001-9469-2631)
Institutions
- The University of Tokyo (JP)
Publication Details
- Journal
- Japanese Journal of Applied Physics
- Published
- 2024-12-19
- DOI
- https://doi.org/10.35848/1347-4065/ada163
- Citations
- 1
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.21
Funders
- Japan Society for the Promotion of Science
- Division of Materials Research