Development and Characterization of PMUTs using Enchanced C-SOI Wafers

This paper presents the development of Piezoelectric Micromachined Ultrasonic Transducers (PMUTs) on an Enhanced Cavity Silicon-On-Insulator (EC-SOI) wafer. An AlN (aluminum nitride) based PMUT array, designed to operate at 7 MHz in water (9.5 MHz in air) with a size of 2.05 x 2.05 mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>, was developed. The development EC-SOI wafer involved adding extra steps to locally remove material from the device layer of a standard C-SOI wafer. This process enhanced the uniformity in thickness at the wafer level of the device layer. PMUT arrays were fabricated on both C-SOI and EC-SOI wafers for comparison. Wafer-level electrical characterization showed that the frequency uniformity of PMUTs on the EC-SOI wafer was more than 3 times better than that of PMUTs fabricated on standard C-SOI wafers. The wafer-level resonance frequency variation was less than 3.5%, and 95% of the chips exhibited a frequency variation of less than 2%. Acoustic characterization of the PMUT array demonstrated a transmit sensitivity of 6.9 kPa/V and a bandwidth of 2.8 MHz at resonance.

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Publication Details

Published
2024-09-22
DOI
https://doi.org/10.1109/uffc-js60046.2024.10794038
Primary Topic
Synthesis and properties of polymers
Type
article
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article

Development and Characterization of PMUTs using Enchanced C-SOI Wafers

Teuvo Sillanpää, Katja Parkkinen, Cyril Baby Karuthedath, Juha Larismaa et al.
Synthesis and properties of polymers
article

Development and Characterization of PMUTs using Enchanced C-SOI Wafers

Teuvo Sillanpää, Katja Parkkinen, Cyril Baby Karuthedath, Juha Larismaa, Abhilash Thanniyil Sebastian
article en

Abstract

This paper presents the development of Piezoelectric Micromachined Ultrasonic Transducers (PMUTs) on an Enhanced Cavity Silicon-On-Insulator (EC-SOI) wafer. An AlN (aluminum nitride) based PMUT array, designed to operate at 7 MHz in water (9.5 MHz in air) with a size of 2.05 x 2.05 mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>, was developed. The development EC-SOI wafer involved adding extra steps to locally remove material from the device layer of a standard C-SOI wafer. This process enhanced the uniformity in thickness at the wafer level of the device layer. PMUT arrays were fabricated on both C-SOI and EC-SOI wafers for comparison. Wafer-level electrical characterization showed that the frequency uniformity of PMUTs on the EC-SOI wafer was more than 3 times better than that of PMUTs fabricated on standard C-SOI wafers. The wafer-level resonance frequency variation was less than 3.5%, and 95% of the chips exhibited a frequency variation of less than 2%. Acoustic characterization of the PMUT array demonstrated a transmit sensitivity of 6.9 kPa/V and a bandwidth of 2.8 MHz at resonance.

Okmetic (Finland) (FI), VTT Technical Research Centre of Finland (FI)
Openalex Percentile: Top 82%
Synthesis and properties of polymers
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