Thermal excitation of carriers at tail states and recombination rate in hydrogenated amorphous silicon

Abstract Measurements of low-energy photoluminescence (PL) in hydrogenated amorphous silicon (a-Si:H) have been performed by means of frequency-resolved spectroscopy. Temperature variation of radiative recombination rate of electron–hole pairs and thermal excitation of carriers at the tail states are discussed. The results suggest that the tail electrons do not contribute to the PL of the energy lower than 1.0 eV. Experimental results are quantitatively explained by considering a two-level system instead of the tail states.

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Publication Details

Journal
Journal of Materials Science Materials in Electronics
Published
2024-12-18
DOI
https://doi.org/10.1007/s10854-024-14062-6
Primary Topic
Thin-Film Transistor Technologies
Type
article
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article

Thermal excitation of carriers at tail states and recombination rate in hydrogenated amorphous silicon

C. Ogihara
Journal of Materials Science Materials in Electronics
Thin-Film Transistor Technologies
article

Thermal excitation of carriers at tail states and recombination rate in hydrogenated amorphous silicon

C. Ogihara
article en

Abstract

Abstract Measurements of low-energy photoluminescence (PL) in hydrogenated amorphous silicon (a-Si:H) have been performed by means of frequency-resolved spectroscopy. Temperature variation of radiative recombination rate of electron–hole pairs and thermal excitation of carriers at the tail states are discussed. The results suggest that the tail electrons do not contribute to the PL of the energy lower than 1.0 eV. Experimental results are quantitatively explained by considering a two-level system instead of the tail states.

Journal of Materials Science Materials in ElectronicsVol. 36(1)
Yamaguchi University (JP)
Affordable and clean energy
Openalex Percentile: Top 79%
Thin-Film Transistor Technologies
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