ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGE IN HMDS VAPOR AS A COATING DEPOSITION INSTRUMENT

The paper demonstrates the possibility of using a dielectric barrier discharge for the deposition of polymer organosilicate films on the surface of glass substrates. A planar barrier discharge of atmospheric pressure was excited in a flow reactor in an atmosphere of (Bis(trimethylsilyl)amine at a fixed flow rate. Helium as the carrier gas was used. The carrier gas and working fluid flow rates were fixed at 45 ml/s and 0.2 ml/s, respectively. The frequency of the dielectric barrier discharge was 50 Hz, the average discharge current was 3 mA at a total power put into the discharge of 24 VA. The deposition time varied in the range of 30–1200 s. It was shown that under the conditions studied, the discharge has a filamentous form. The study of the surface morphology and elemental composition of the deposited film was carried out using scanning electron microscopy and energy-dispersive spectroscopy. Surface wettability was determined by the contact angle method and the method of photofixation of drops. The elemental composition of the deposited coatings indicates the formation of an organosilicon film. The contact angle method for polar (distilled water) and non-polar (diiodomethane, glycerol) liquids showed that the wettability of the deposited coatings is higher than that of the original substrate. Additionally, the effect of storage time of deposited coatings (under normal conditions) on their properties was studied. It was found that the storage effect does not have a significant effect on the wettability of the films. For citation: Shutov D.A., Ivanov A.N., Sungurova A.V., Ignatiev A.A., Morozova Yu.N., Rybkin V.V. Atmospheric pressure dielectric barrier discharge in hmds vapor as a coating deposition instrument. ChemChemTech [Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol.]. 2024. V. 67. N 12. P. 80-85. DOI: 10.6060/ivkkt.20246712.7148.