Comparison of ultra-short pulses laser damage performance of UV AR coatings deposited by e-beam evaporation and magnetron sputtering

Thin-film layer systems coated by various techniques on the optical component surface are the most common method to finishing laser optics. Anti-reflective thin-film coatings are essential in laser optics to limit unwanted retro-reflections and decrease the reflection-induced losses occurring on boundaries of optical materials and air. Several different technologies are available to prepare laser-quality coatings, when the most common are magnetron sputtering and electron-beam ion-assisted deposition. However, coating materials and deposition parameters may significantly affect both laser resistance and optical quality of the coatings, and the influence of mentioned factors is getting stronger with shorter wavelengths. In following will be disseminated laser damage threshold of anti-reflective coatings prepared by e-beam evaporation with ion assisted deposition and plasma activated reactive magnetron sputtering at wavelength 343 nm in ultra-short pulses regime.