Exploring potential for semiconductor to quantum anomalous Hall insulator transitions via substrate-induced structural modifications in Ti <sub>3</sub>Se <sub>4</sub> monolayers
The quantum anomalous Hall (QAH) effect in two-dimensional (2D) topological materials has attracted widespread attention due to its potential for dissipationless chiral edge transport without an external magnetic field, which is highly promising for low-power electronic applications. However, identifying materials that exhibit these properties remains particularly challenging, as only a limited number of such materials are known, raising the intriguing question of whether it is possible to induce the QAH effect in materials with ordinary properties through structural modifications. In this work, we grow an unreported 2D titanium selenide (Ti<sub>3</sub>Se<sub>4</sub>) on a Cu(111) substrate using molecular beam epitaxy. Low-energy electron diffraction and scanning tunneling microscopy characterizations reveal a <inline-formula id="M1"> <math id="mathml_M1" display="inline" overflow="scroll"><mrow class="MJX-TeXAtom-ORD"><mrow class="MJX-TeXAtom-ORD"><mrow class="MJX-TeXAtom-ORD"><msqrt><mtext>7</mtext></msqrt></mrow><mo>×</mo><msqrt><mtext>7</mtext></msqrt></mrow></mrow></math></inline-formula> brick-like structure. First-principles calculations and X-ray photoelectron spectroscopy measurements confirm its composition to be Ti<sub>3</sub>Se<sub>4</sub>. Our calculations further demonstrate that monolayer Ti<sub>3</sub>Se<sub>4</sub>, in its grown form on Cu(111), has the potential to host the QAH effect. Interestingly, when we examine its freestanding form, the monolayer transitions from a QAH insulator candidate into a conventional semiconductor, despite only minor differences in their atomic structures. This transition enlightens us that subtle lattice adjustments can induce a transition from semiconductor to QAH properties in freestanding Ti<sub>3</sub>Se<sub>4</sub>. This discovery provides a potential route to engineering practical materials that may exhibit the QAH effect.
Authors
- Jierui Huang (ORCID: https://orcid.org/0000-0002-7315-0232)
- Hong-Liang Lü (ORCID: https://orcid.org/0000-0003-2398-720X)
- Jiaou Wang (ORCID: https://orcid.org/0000-0002-4686-1821)
- Haixia Cheng (ORCID: https://orcid.org/0000-0001-9586-4837)
- Yun Cao (ORCID: https://orcid.org/0000-0002-7518-2481)
- Chengmin Shen (ORCID: https://orcid.org/0000-0003-4716-9367)
- Guang‐Chao Chen (ORCID: https://orcid.org/0000-0002-4980-4718)
- Yurou Guan
- Zhipeng Song (ORCID: https://orcid.org/0000-0001-8132-870X)
- Qi Zheng (ORCID: https://orcid.org/0000-0001-9807-6860)
- Hong-Jun Gao (ORCID: https://orcid.org/0000-0002-2088-0522)
- Wei Ji (ORCID: https://orcid.org/0000-0001-5249-6624)
- Li Huang (ORCID: https://orcid.org/0000-0002-5964-7090)
- Hui Guo (ORCID: https://orcid.org/0009-0007-6542-5148)
- Xiao Lin
- Chen Liu (ORCID: https://orcid.org/0009-0000-7349-8610)
Institutions
- Institute of High Energy Physics (AT)
- Institute of High Energy Physics (CN)
- University of Chinese Academy of Sciences (CN)
- Renmin University of China (CN)
Publication Details
- Journal
- Nano Research
- Published
- 2024-12-16
- DOI
- https://doi.org/10.26599/nr.2025.94907123
- Primary Topic
- Surface and Thin Film Phenomena
- Type
- article
- Field-Weighted Citation Impact
- 0.00