Fully Transparent and Distortion‐Free Monotonically Stretchable Substrate by Nanostructure Alignment

Stretchable devices, garnering increasing attention as next-generation form factors, have a crucial problem in that vertical contraction occurs during stretching, causing image distortion of stretchable displays and discomfort in skin-attached devices. Previous structural strategies to mitigate vertical contraction, such as auxetic reentrants and wrinkles, suffer from the drawback that their structure becomes visible during stretching. In this study, this issue is addressed by unidirectionally aligning nanoscopic cylinders within block copolymer elastomer films. Employing a shear-rolling process at high temperatures on thick films of polystyrene-block-polyisobutylene-block-polystyrene thermoplastic elastomers, macroscopic mechanical anisotropy is achieved, resulting in completely transparent and monotonically stretchable substrates devoid of vertical or depth distortion during deformation. Significantly, the unidirectional orientation of high-modulus cylindrical nanostructures induces macroscopic mechanical anisotropy with a modulus ratio exceeding five times. While the Poisson's ratio of conventional elastic materials hovers around ≈0.5, this mechanical anisotropy minimizes vertical contraction, yielding a Poisson's ratio below 0.07. Moreover, owing to the negligible size of the nanocylinders compared to visible-light wavelengths, the substrate can be monotonically uniaxially stretched while maintaining high transmittance without introducing distortions, surface undulations, or haziness, resulting in distortion-free stretchable substrates.

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Institutions

Publication Details

Journal
Advanced Materials
Published
2024-12-12
DOI
https://doi.org/10.1002/adma.202414794
Citations
5
Primary Topic
Advanced Materials and Mechanics
Type
article
Field-Weighted Citation Impact
1.06

Funders

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article

Fully Transparent and Distortion‐Free Monotonically Stretchable Substrate by Nanostructure Alignment

Seungjun Chung, Sujin Jeong, Jeong Gon Son, Jonghwi Lee et al.
5 citations
Advanced Materials
Advanced Materials and Mechanics
1.06
article

Fully Transparent and Distortion‐Free Monotonically Stretchable Substrate by Nanostructure Alignment

Seungjun Chung, Sujin Jeong, Jeong Gon Son, Jonghwi Lee, Jinhan Cho, Jung Hur, Hwaeun Park, Yongtaek Hong, Hyeongsu Oh
article en
5 citations

Abstract

Stretchable devices, garnering increasing attention as next-generation form factors, have a crucial problem in that vertical contraction occurs during stretching, causing image distortion of stretchable displays and discomfort in skin-attached devices. Previous structural strategies to mitigate vertical contraction, such as auxetic reentrants and wrinkles, suffer from the drawback that their structure becomes visible during stretching. In this study, this issue is addressed by unidirectionally aligning nanoscopic cylinders within block copolymer elastomer films. Employing a shear-rolling process at high temperatures on thick films of polystyrene-block-polyisobutylene-block-polystyrene thermoplastic elastomers, macroscopic mechanical anisotropy is achieved, resulting in completely transparent and monotonically stretchable substrates devoid of vertical or depth distortion during deformation. Significantly, the unidirectional orientation of high-modulus cylindrical nanostructures induces macroscopic mechanical anisotropy with a modulus ratio exceeding five times. While the Poisson's ratio of conventional elastic materials hovers around ≈0.5, this mechanical anisotropy minimizes vertical contraction, yielding a Poisson's ratio below 0.07. Moreover, owing to the negligible size of the nanocylinders compared to visible-light wavelengths, the substrate can be monotonically uniaxially stretched while maintaining high transmittance without introducing distortions, surface undulations, or haziness, resulting in distortion-free stretchable substrates.

Advanced MaterialsVol. 37(6)
Seoul National University (KR), Korea University (KR), Korea Institute of Science and Technology (KR), Chung-Ang University (KR)
National Research Foundation, Korea Institute of Science and Technology, National Research Foundation of Korea, Ministry of Science and ICT, South Korea, KU-KIST Graduate School of Converging Science and Technology
Openalex Percentile: Top 25%
Advanced Materials and Mechanics
1.06
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