Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant

Abstract Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents a key trend in the advancement of metrology. This study explores the periodic accuracy and overall uniformity of self-traceable gratings, employing multilayer film gratings with a nominal period of 25.00 nm as the medium. We present a comparative analysis of measurement capabilities in a self-traceable grating calibration system characterized by a ‘top-down’ calibration approach and a Si lattice constant calibration system characterized by a ‘bottom-up’ calibration approach. The results indicate that the values obtained for the multilayer film grating periods, calibrated using the self-traceable grating system, are 24.40 nm with a standard deviation of 0.11 nm. By comparing with the values derived from the Si lattice constant, which yield 24.34 nm with a standard deviation of 0.14 nm, the validity and feasibility of the self-traceable calibration system are confirmed. This system extends and complements existing metrological frameworks, offering a precise pathway for traceability in precision engineering and nanotechnology research.

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Publication Details

Journal
Chinese Physics B
Published
2024-12-13
DOI
https://doi.org/10.1088/1674-1056/ad9e9a
Primary Topic
Optical Systems and Laser Technology
Type
article
Field-Weighted Citation Impact
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article

Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant

Deng Xiao, Guangxu Xiao, Ziruo Wu, Yingfan Xiong et al.
Chinese Physics B
Optical Systems and Laser Technology
article

Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant

Deng Xiao, Guangxu Xiao, Ziruo Wu, Yingfan Xiong, Xinbin Cheng, Tongbao Li, Rui–Xue Xu, Zhaohui Tang, Jingtong Feng, Lihua Lei, Yuying Xie, Dongbai Xue
article en

Abstract

Abstract Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents a key trend in the advancement of metrology. This study explores the periodic accuracy and overall uniformity of self-traceable gratings, employing multilayer film gratings with a nominal period of 25.00 nm as the medium. We present a comparative analysis of measurement capabilities in a self-traceable grating calibration system characterized by a ‘top-down’ calibration approach and a Si lattice constant calibration system characterized by a ‘bottom-up’ calibration approach. The results indicate that the values obtained for the multilayer film grating periods, calibrated using the self-traceable grating system, are 24.40 nm with a standard deviation of 0.11 nm. By comparing with the values derived from the Si lattice constant, which yield 24.34 nm with a standard deviation of 0.14 nm, the validity and feasibility of the self-traceable calibration system are confirmed. This system extends and complements existing metrological frameworks, offering a precise pathway for traceability in precision engineering and nanotechnology research.

Chinese Physics BVol. 34(2)
Shanghai Institute of Measurement and Testing Technology (CN), Shanghai Institute of Optics and Fine Mechanics (CN)
Industry, innovation and infrastructure
Openalex Percentile: Top 79%
Optical Systems and Laser Technology
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