Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant
Abstract Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents a key trend in the advancement of metrology. This study explores the periodic accuracy and overall uniformity of self-traceable gratings, employing multilayer film gratings with a nominal period of 25.00 nm as the medium. We present a comparative analysis of measurement capabilities in a self-traceable grating calibration system characterized by a ‘top-down’ calibration approach and a Si lattice constant calibration system characterized by a ‘bottom-up’ calibration approach. The results indicate that the values obtained for the multilayer film grating periods, calibrated using the self-traceable grating system, are 24.40 nm with a standard deviation of 0.11 nm. By comparing with the values derived from the Si lattice constant, which yield 24.34 nm with a standard deviation of 0.14 nm, the validity and feasibility of the self-traceable calibration system are confirmed. This system extends and complements existing metrological frameworks, offering a precise pathway for traceability in precision engineering and nanotechnology research.
Authors
- Deng Xiao (ORCID: https://orcid.org/0000-0002-4919-8201)
- Guangxu Xiao (ORCID: https://orcid.org/0000-0003-3996-6622)
- Ziruo Wu
- Yingfan Xiong
- Xinbin Cheng (ORCID: https://orcid.org/0000-0002-3855-483X)
- Tongbao Li (ORCID: https://orcid.org/0009-0003-0480-9181)
- Rui–Xue Xu (ORCID: https://orcid.org/0000-0001-9931-201X)
- Zhaohui Tang (ORCID: https://orcid.org/0000-0002-2903-8008)
- Jingtong Feng
- Lihua Lei (ORCID: https://orcid.org/0000-0002-9289-603X)
- Yuying Xie (ORCID: https://orcid.org/0009-0003-1396-1038)
- Dongbai Xue (ORCID: https://orcid.org/0009-0008-8384-6066)
Institutions
- Shanghai Institute of Measurement and Testing Technology (CN)
- Shanghai Institute of Optics and Fine Mechanics (CN)
Publication Details
- Journal
- Chinese Physics B
- Published
- 2024-12-13
- DOI
- https://doi.org/10.1088/1674-1056/ad9e9a
- Primary Topic
- Optical Systems and Laser Technology
- Type
- article
- Field-Weighted Citation Impact
- 0.00