DC reactive sputtering synthesis of titanium nitride coatings on titanium for biomedical applications

Abstract In this study, the titanium nitride (TiN) films were deposited on Ti substrates using DC reactive sputtering. The structure and morphology of the TiN films were analyzed by X‐ray diffraction, scanning electron microscopy, energy dispersive X‐ray spectroscopy, X‐ray photoelectron spectrometry and Auger electron spectroscopy. In vitro biocompatibility of the TiN films was evaluated using scanning electron microscopy and a confocal electron scanning microscope. The results show that TiN films have been successfully formed, hardness and in vitro biocompatibility have been improved compared to that of Ti substrates.