Total Ionizing Dose Effects of <i>β</i>-Ga₂O₃ Schottky Barrier Diode on Different Bias Conditions
This article focuses on investigating the total ionizing dose (TID) effects of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3-based Schottky barrier diodes (SBDs). The TID degradation behavior and mechanisms are evaluated by varying irradiation bias conditions, conducted through dc, capacitance–voltage (C–V), and low-frequency noise (LFN) measurements. At a dose of 1 Mrad(Si), the irradiated devices demonstrate a noticeable increase in both forward and reverse currents. This increase is primarily attributed to the rise in defect concentration caused by ionizing damage resulting from TID effects. The TID degradation of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 SBD is significantly influenced by bias conditions, with devices under high electric fields experiencing more severe degradation. Specifically, a high reverse electric field during radiation leads to a notable increase in interface defects of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 SBDs, this result was validated through TCAD simulation. The reverse bias voltage exacerbates TID effects and reduces the radiation tolerance of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 SBD devices.
Authors
- Hongjia Song (ORCID: https://orcid.org/0000-0003-0288-2425)
- Hong Zhang (ORCID: https://orcid.org/0009-0006-5130-5332)
- Teng Ma (ORCID: https://orcid.org/0000-0001-7989-9802)
- Chao Peng (ORCID: https://orcid.org/0000-0003-2486-7605)
- Zhangang Zhang (ORCID: https://orcid.org/0000-0002-6400-9931)
- Zhifeng Lei (ORCID: https://orcid.org/0000-0003-0541-3739)
- Weili Fu
- Daoyou Guo (ORCID: https://orcid.org/0000-0002-6191-1655)
- Xing Li (ORCID: https://orcid.org/0009-0004-1200-2924)
- Yuangang Wang (ORCID: https://orcid.org/0000-0002-4240-7875)
- Liang He (ORCID: https://orcid.org/0000-0003-3650-5679)
- Tao Xiao (ORCID: https://orcid.org/0000-0002-5223-9377)
- Jinbin Wang (ORCID: https://orcid.org/0000-0001-5192-7648)
- Xiangli Zhong (ORCID: https://orcid.org/0000-0003-1520-3567)
Institutions
- Zhejiang Sci-Tech University (CN)
- China Electronic Product Reliability and Environmental Test Institute (CN)
- Hebei Semiconductor Research Institute (CN)
- Xiangtan University (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2024-12-13
- DOI
- https://doi.org/10.1109/ted.2024.3505847
- Citations
- 5
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.59
Funders
- National Natural Science Foundation of China