Experimental Study on Influencing Factors of Seebeck Coefficient by Using NiCr/NiSi Thin‐Film Thermocouple Prepared and Calibrated

Accurate calibration of the Seebeck coefficient is crucial for reliable temperature measurements using thin‐film thermocouples. In this study, the calibration of NiCr/NiSi thin‐film thermocouples is investigated for precise temperature measurements. Using the magnetron sputtering method, a series of NiCr/NiSi film thermocouples are prepared and their Seebeck coefficients are obtained through standard calibration procedures. The results demonstrate good consistency and reproducibility of the thermoelectric output within the temperature range of 0–505 °C. Notably, the Seebeck coefficients remain nearly constant regardless of changes in the top and bottom order or resistance values of the NiCr and NiSi thermoelectrodes. Furthermore, it is found that the addition of an SiO 2 protective film does not affect the calibration Seebeck coefficients of the NiCr/NiSi film thermocouples, with values of 7.94 and 7.96 μV °C for film thermocouples with and without SiO 2 , respectively. These findings provide valuable insights into the calibration of thin‐film thermocouples and can enhance the accuracy of temperature measurements. The study contributes to scientific research and engineering applications in the field of thin‐film thermocouple calibration.

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Publication Details

Journal
physica status solidi (a)
Published
2024-12-13
DOI
https://doi.org/10.1002/pssa.202400653
Citations
4
Primary Topic
Advanced Sensor Technologies Research
Type
article
Field-Weighted Citation Impact
0.74
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article

Experimental Study on Influencing Factors of Seebeck Coefficient by Using NiCr/NiSi Thin‐Film Thermocouple Prepared and Calibrated

Xingshu Wang, Maopeng Zhang, Wanyu Ding, Yi Sun et al.
4 citations
physica status solidi (a)
Advanced Sensor Technologies Research
0.74
article

Experimental Study on Influencing Factors of Seebeck Coefficient by Using NiCr/NiSi Thin‐Film Thermocouple Prepared and Calibrated

Xingshu Wang, Maopeng Zhang, Wanyu Ding, Yi Sun, Zhihui Liu, Zixi Wang, Kai Shen, Wang Bi, Yongjun Cheng, Jiankang Zhou, Mengxuan Wu
article en
4 citations

Abstract

Accurate calibration of the Seebeck coefficient is crucial for reliable temperature measurements using thin‐film thermocouples. In this study, the calibration of NiCr/NiSi thin‐film thermocouples is investigated for precise temperature measurements. Using the magnetron sputtering method, a series of NiCr/NiSi film thermocouples are prepared and their Seebeck coefficients are obtained through standard calibration procedures. The results demonstrate good consistency and reproducibility of the thermoelectric output within the temperature range of 0–505 °C. Notably, the Seebeck coefficients remain nearly constant regardless of changes in the top and bottom order or resistance values of the NiCr and NiSi thermoelectrodes. Furthermore, it is found that the addition of an SiO 2 protective film does not affect the calibration Seebeck coefficients of the NiCr/NiSi film thermocouples, with values of 7.94 and 7.96 μV °C for film thermocouples with and without SiO 2 , respectively. These findings provide valuable insights into the calibration of thin‐film thermocouples and can enhance the accuracy of temperature measurements. The study contributes to scientific research and engineering applications in the field of thin‐film thermocouple calibration.

physica status solidi (a)Vol. 222(6)
Dalian Jiaotong University (CN), Tsinghua University (CN)
Openalex Percentile: Top 31%
Advanced Sensor Technologies Research
0.74
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