Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies

Liquid delivery systems have been commercialized to supply precursors to the atomic layer deposition (ALD) reactor at high flow rates. However, the complicated internal structure of the conventional vaporizer causes a problem of slow flow and temperature deviation. In this paper, we propose a cyclone-type vaporizer with a simple structure to supply ALD precursors in large quantities. We investigated the effect of key design parameters on the gas flow and temperature distribution inside the vaporizer by computational fluid dynamics analysis. The design parameters were optimized by considering the flow velocity distribution, residence time at the bottom, and temperature uniformity inside the vaporizer. In the optimized model, a swirling flow was actively formed to reach the bottom of the vaporizer with high flow velocity. The cyclone vaporizer with optimized design parameters was constructed to test its vaporization performance. The cyclone vaporizer vaporized all the injected CpZr(NMe2)3 at a constant feed rate of 4 g/min.

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Publication Details

Journal
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Published
2024-12-12
DOI
https://doi.org/10.1116/6.0004013
Primary Topic
Catalytic Processes in Materials Science
Type
article
Field-Weighted Citation Impact
0.00

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article

Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies

Donggeon Shin, K. Jeong, Y. P. Lee, Cha-Hee Kim et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Catalytic Processes in Materials Science
article

Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies

Donggeon Shin, K. Jeong, Y. P. Lee, Cha-Hee Kim, Hyun Koock Shin, Seung-Ho Seo, Dae‐Hyun Kim, Won‐Jun Lee
article en

Abstract

Liquid delivery systems have been commercialized to supply precursors to the atomic layer deposition (ALD) reactor at high flow rates. However, the complicated internal structure of the conventional vaporizer causes a problem of slow flow and temperature deviation. In this paper, we propose a cyclone-type vaporizer with a simple structure to supply ALD precursors in large quantities. We investigated the effect of key design parameters on the gas flow and temperature distribution inside the vaporizer by computational fluid dynamics analysis. The design parameters were optimized by considering the flow velocity distribution, residence time at the bottom, and temperature uniformity inside the vaporizer. In the optimized model, a swirling flow was actively formed to reach the bottom of the vaporizer with high flow velocity. The cyclone vaporizer with optimized design parameters was constructed to test its vaporization performance. The cyclone vaporizer vaporized all the injected CpZr(NMe2)3 at a constant feed rate of 4 g/min.

Journal of Vacuum Science & Technology A Vacuum Surfaces and FilmsVol. 43(1)
Sejong University (KR)
Korea Basic Science Institute, Korea Evaluation Institute of Industrial Technology
Openalex Percentile: Top 86%
Catalytic Processes in Materials Science
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