InGaN/GaN edge emitting laser diodes using an epitaxial lateral overgrowth with a low-defect density area of more than 75%

Abstract We have successfully demonstrated InGaN/GaN edge-emitting laser diodes (EELDs) on a fully coalesced epitaxial lateral overgrown film from a c -plane GaN substrate. We achieve a high aspect ratio, and low defect density wing region covering 75%–88% of the substrates’ surface, which is amongst the largest reported areas in the literature. The devices at the wing region exhibit a threshold current density of 3.63 kA cm −2 at 408 nm, and an improved laser performance compared to the high defect density region is confirmed. Based on this work, it is promising that high performance, cost-efficient c -plane InGaN/GaN EELDs can be realized.

Authors

Institutions

Publication Details

Journal
Japanese Journal of Applied Physics
Published
2024-12-12
DOI
https://doi.org/10.35848/1347-4065/ad9e5d
Citations
2
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.62

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

InGaN/GaN edge emitting laser diodes using an epitaxial lateral overgrowth with a low-defect density area of more than 75%

Nathan Palmquist, Hsun–Ming Chang, Alejandro Quevedo, Matthew S. Wong et al.
2 citations
Japanese Journal of Applied Physics
GaN-based semiconductor devices and materials
0.62
article

InGaN/GaN edge emitting laser diodes using an epitaxial lateral overgrowth with a low-defect density area of more than 75%

Nathan Palmquist, Hsun–Ming Chang, Alejandro Quevedo, Matthew S. Wong, Shuji Nakamura, Emily Trageser, Steven P. DenBaars, Vincent Rienzi, Srinivas Gandrothula, Jiaao Zhang, Stephen Gee, Tanay Tak, Xianqing Li
article en
2 citations

Abstract

Abstract We have successfully demonstrated InGaN/GaN edge-emitting laser diodes (EELDs) on a fully coalesced epitaxial lateral overgrown film from a c -plane GaN substrate. We achieve a high aspect ratio, and low defect density wing region covering 75%–88% of the substrates’ surface, which is amongst the largest reported areas in the literature. The devices at the wing region exhibit a threshold current density of 3.63 kA cm −2 at 408 nm, and an improved laser performance compared to the high defect density region is confirmed. Based on this work, it is promising that high performance, cost-efficient c -plane InGaN/GaN EELDs can be realized.

Japanese Journal of Applied PhysicsVol. 64(1)
University of California, Santa Barbara (US)
Solid State Lighting and Energy Electronics Center, University of California Santa Barbara
Openalex Percentile: Top 31%
GaN-based semiconductor devices and materials
0.62
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.

InGaN/GaN edge emitting laser diodes using an epitaxial lateral overgrowth with a low-defect density area of more than 75% — Nathan Palmquist, Hsun–Ming Chang, et al. · Japanese Journal of Applied Physics (2024) | TGRS Research Map | TGRS