Design and Compromise of RC-IGBT with High Voltage to Suppress Snapback

Compared with the fourth generation field stop trench insulated gate bipolar transistor, the reverse-conducting insulated gate bipolar transistor (RC-IGBT) has the advantages of low cost, small volume and high reliability, which is limited by the inherent rebound phenomenon in the semiconductor back surface process and conduction. In this paper, a high-voltage trench RC-IGBT is designed by process simulation, which is different from the mainstream low voltage in the market. The electrical characteristics are simulated and how to suppress the rebound phenomenon from the design of process parameters is studied. At the same time, the influence of process parameters on the dynamic and static performance of the device is analyzed, and finally a set of process parameter schemes with low loss, high reliability and compromise performance is given.

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Publication Details

Published
2024-08-23
DOI
https://doi.org/10.1109/isset62871.2024.10779787
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
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article

Design and Compromise of RC-IGBT with High Voltage to Suppress Snapback

Xinkai Chen, Yuan He, Zhiming Shan, Shiguang Shang
Silicon Carbide Semiconductor Technologies
article

Design and Compromise of RC-IGBT with High Voltage to Suppress Snapback

Xinkai Chen, Yuan He, Zhiming Shan, Shiguang Shang
article en

Abstract

Compared with the fourth generation field stop trench insulated gate bipolar transistor, the reverse-conducting insulated gate bipolar transistor (RC-IGBT) has the advantages of low cost, small volume and high reliability, which is limited by the inherent rebound phenomenon in the semiconductor back surface process and conduction. In this paper, a high-voltage trench RC-IGBT is designed by process simulation, which is different from the mainstream low voltage in the market. The electrical characteristics are simulated and how to suppress the rebound phenomenon from the design of process parameters is studied. At the same time, the influence of process parameters on the dynamic and static performance of the device is analyzed, and finally a set of process parameter schemes with low loss, high reliability and compromise performance is given.

Xi’an University of Posts and Telecommunications (CN)
Shanxi Provincial Key Research and Development Project
Affordable and clean energy
Openalex Percentile: Top 80%
Silicon Carbide Semiconductor Technologies
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