Optimization of Irrigation Scheduling and Foliar Spray of Silicon on Growth, Yield and Water Use Efficiency of Wheat

Silicon is generally considered a beneficial element for crop especially under water stress/deficit condition but the mechanisms remain unclear. Here, we focus on optimization of irrigation scheduling and the effect of silicon through foliar spray for improving plant tolerance under drought stresses situation at deficit irrigation levels under semi-arid tropical condition of India. A field experiment was conducted with objective of foliar spray of silicon on growth, yield and water use efficiency of wheat (Triticum aestivum L.) under deficit irrigation at C.P. College of Agriculture, Sardarkrushinagar Dantiwada Agricultural University, Gujarat, India during the rabi season of 2023-24. The experiment was laid out in a split plot design with four replications, consisting of twelve treatment combinations comprising three irrigation levels in main plot viz., I1: 0.6 IW/CPE, I2: 0.8 IW/CPE, I3: 1.0 IW/CPE and four silicon levels in sub plot viz, S0: Control, S1: Silicon @ 0.5%, S2: Silicon @ 1.0%, S3: Silicon @ 1.5%. The results of the present study revealed that Irrigation scheduling at 0.8 IW/CPE combined with foliar spray of silicon @ 1.0% significantly enhanced wheat growth, yield attributes and grain yield (3970 kg/ha) and water use efficiency (10.87 kg/ha-mm) of wheat. Higher silicon levels mitigated drought stress, optimizing productivity under deficit irrigation. The maximum predicted yield (4123 kg/ha) occurred at 411.5 mm irrigation depth, beyond which yields declined.