Improving Energy Resolution of CdSe-Based γ-Ray Detectors through Asymmetric Schottky Contact Engineering Using Oxygen Plasma Treatment
When creating a Schottky contact to suppress the leakage current of semiconductor γ-ray detectors and improve their energy resolution, it is successfully employed the fact that the formation of a Schottky barrier is determined not only by the difference in the electrode and semiconductor work functions but also affected by the semiconductor surface state. Oxygen plasma (OP) treatment has been used to modify the surface states of CdSe single crystals (SCs) prior to the Au electrode deposition, thereby creating a Schottky contact at the metal-semiconductor interface. The <i>n</i>-type Schottky contact formation has been confirmed by the <i>I</i>-<i>V</i> characteristics and ultraviolet photoelectron spectroscopy analysis. X-ray photoelectron spectroscopy has shown that the stoichiometric state of the CdSe SC surface changes from a Cd-deficient (untreated surface) to a near-ideal stoichiometric (OP-treated surface). In addition, a newly formed CdSeO<sub>3</sub> component has been revealed, which is beneficial for suppressing the surface leakage current. The Au/CdSe/Au radiation detector with the single-sided OP-treated surface (Schottky diode) exhibits a higher energy resolution of (23.93 ± 0.89)% for <sup>241</sup>Am 59.5 keV γ-rays compared to that of the detectors without surface treatment ((44.66 ± 2.25)%). The energy resolution of the champion CdSe-based Schottky diode type γ-ray detector for <sup>241</sup>Am 59.5 keV γ-rays can reach 22.72%.
Authors
- Gang Meng (ORCID: https://orcid.org/0000-0002-3365-8963)
- Yanan Song (ORCID: https://orcid.org/0000-0002-5844-2712)
- Xiao Zhao (ORCID: https://orcid.org/0000-0002-7357-2697)
- V. A. Gnatyuk (ORCID: https://orcid.org/0000-0001-6412-2064)
- Shimao Wang (ORCID: https://orcid.org/0000-0002-4495-6130)
- Changbao Huang (ORCID: https://orcid.org/0000-0003-3659-6830)
- Qianqian Hu (ORCID: https://orcid.org/0000-0001-9266-8582)
- Haixin Wu (ORCID: https://orcid.org/0000-0002-3679-9403)
- Youbao Ni
Institutions
- University of Science and Technology of China (CN)
- Anhui University (CN)
- National Academy of Sciences of Ukraine (UA)
- Chinese Academy of Sciences (CN)
- Hefei Institutes of Physical Science (CN)
- V.E. Lashkaryov Institute of Semiconductor Physics (UA)
- Anhui Institute of Optics and Fine Mechanics (CN)
Publication Details
- Journal
- ACS Applied Materials & Interfaces
- Published
- 2024-12-11
- DOI
- https://doi.org/10.1021/acsami.4c12403
- Primary Topic
- Advanced Semiconductor Detectors and Materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China
- State Key Laboratory of Particle Detection and Electronics