Schottky-MIS Cascode Drain Reverse-Blocking p-GaN Gate Transistor With Significantly Reduced Forward Drop and Ultralow Leakage Current

In this article, we experimentally propose a reverse-blocking (RB) p-GaN gate transistor with the Schottky-MIS cascode drain (CDT) for the significantly reduced forward voltage drop <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${\textit {V}}_{\mathbf {F}}$ </tex-math></inline-formula> and ultralow reverse leakage current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula>. At forward bias, electron concentration at the Schottky-MIS cascode drain is higher than that at conventional p-GaN/Ohmic drain. When experiencing reverse bias, the Schottky-MIS cascode drain effectively protects the Schottky contact from the high reverse potential compared to Schottky drain. The fabricated Schottky-MIS CDT presents a superior <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {F}}$ </tex-math></inline-formula> - <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula> relationship including a greatly reduced <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {F}}$ </tex-math></inline-formula> of 3.1V as well as an ultralow <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${1}\times {10} ^{-{8}}$ </tex-math></inline-formula> A/mm, together with a competitive reverse power figure-of-merit (FOM) of 120MW/cm2. These performances suggest that the proposed Schottky-MIS CDT can be a promising candidate for low-loss RB GaN power transistors and applications requiring a better <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {F}}$ </tex-math></inline-formula> - <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I} _{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula> trade-off.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2024-12-11
DOI
https://doi.org/10.1109/led.2024.3515211
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.00

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article

Schottky-MIS Cascode Drain Reverse-Blocking p-GaN Gate Transistor With Significantly Reduced Forward Drop and Ultralow Leakage Current

Ping Yu, Zeheng Wang, Xinghuan Chen, Cheng Yu et al.
IEEE Electron Device Letters
GaN-based semiconductor devices and materials
article

Schottky-MIS Cascode Drain Reverse-Blocking p-GaN Gate Transistor With Significantly Reduced Forward Drop and Ultralow Leakage Current

Ping Yu, Zeheng Wang, Xinghuan Chen, Cheng Yu, Wanjun Chen, Zhuocheng Wang, Bo Zhang, Xiaoliang Wang, Xiaohui Wang, Yang Wang, Hong Chen, Haiqiang Jia, Guojian Ding, Chang Gao, Fangzhou Wang, Qi Feng
article en

Abstract

In this article, we experimentally propose a reverse-blocking (RB) p-GaN gate transistor with the Schottky-MIS cascode drain (CDT) for the significantly reduced forward voltage drop <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${\textit {V}}_{\mathbf {F}}$ </tex-math></inline-formula> and ultralow reverse leakage current <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula>. At forward bias, electron concentration at the Schottky-MIS cascode drain is higher than that at conventional p-GaN/Ohmic drain. When experiencing reverse bias, the Schottky-MIS cascode drain effectively protects the Schottky contact from the high reverse potential compared to Schottky drain. The fabricated Schottky-MIS CDT presents a superior <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {F}}$ </tex-math></inline-formula> - <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula> relationship including a greatly reduced <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {F}}$ </tex-math></inline-formula> of 3.1V as well as an ultralow <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${1}\times {10} ^{-{8}}$ </tex-math></inline-formula> A/mm, together with a competitive reverse power figure-of-merit (FOM) of 120MW/cm2. These performances suggest that the proposed Schottky-MIS CDT can be a promising candidate for low-loss RB GaN power transistors and applications requiring a better <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {F}}$ </tex-math></inline-formula> - <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I} _{\mathbf {\textit {LEAK}}}$ </tex-math></inline-formula> trade-off.

IEEE Electron Device LettersVol. 46(2)
University of Electronic Science and Technology of China (CN), Southern University of Science and Technology (CN), China Electronic Product Reliability and Environmental Test Institute (CN), Songshan Lake Materials Laboratory (CN), CSIRO Manufacturing (AU)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 86%
GaN-based semiconductor devices and materials
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