Deposition of ReS2 Thin Films Using Aerosol-Assisted Chemical Vapor Deposition

Transition metal dichalcogenides (TMDCs) have remarkable properties, which can make these materials as a source alternative to graphene. The new member of TMDCs family ReS2 has got interest because its unique property. Synthesis ReS2 still needs a high temperature to deposit; the high deposition temperature makes ReS2 materials highly cost to produce. In this work the rhenium carbamate complex ([Re2(μ-S)2(S2CNEt2)4]) which have a high thermal stability was used to synthesis ReS2 thin films by reducing the deposition temperature to 525 °C, 25 °C less from previous study. The produced thin films were deposited using Aerosol-Assisted Chemical Vapor Deposition (AA-CVD). Films have been characterized firstly by p-XRD which confirmed that ReS2 thin films were successfully prepared, then the morphology of thin film were investigated by SEM and the results showed morphology was smooth and uniformed.