Application of path planning in vector scanning electron beam lithography
During exposure of vector scanning electron beam lithography, the hysteresis effect of scanning coils and the instability of electron beam current will affect the smoothness of the edge of the exposure pattern. To address this issue, this paper proposes a novel scanning strategy, comprising inward spiral scanning along the edges to expose the periphery of the pattern and meandering scanning to achieve uniform exposure inside the pattern. The experimental results demonstrate that the proposed scanning strategy is capable of exposing patterns with smoother edges than the traditional scanning method.
Authors
- Jiacong Zhao (ORCID: https://orcid.org/0000-0002-5978-0318)
- Dapeng Dapeng
- Xuefeng Song (ORCID: https://orcid.org/0000-0002-8579-8706)
- Zhihao Lan (ORCID: https://orcid.org/0000-0002-1322-5925)
- Siyu Feng (ORCID: https://orcid.org/0000-0001-8499-6914)
- Wenhao Wang (ORCID: https://orcid.org/0000-0002-8496-5648)
- Zhensheng Zhang (ORCID: https://orcid.org/0000-0002-0572-0192)
- Kangpeng Huang
Institutions
- Southern University of Science and Technology (CN)
- Hefei National Center for Physical Sciences at Nanoscale (CN)
- Beijing Academy of Quantum Information Sciences (CN)
Publication Details
- Published
- 2024-12-10
- DOI
- https://doi.org/10.1117/12.3052898
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00