EUV lithography imaging modeling and calculation based on full-vector beam propagation method

Accurately and efficiently calculating the near field of the EUV mask with large-scale and complex patterns is a critical part of EUV aerial image simulation. Therefore, a calculation method based on the full-vector beam propagation method is proposed, which successfully realizes ultra-fast near-filed calculation with comparable accuracy for the investigated examples. The proposed method shows strong competitiveness for EUV mask near-field calculation and can also be applied to calculate the EUV aerial image accurately and efficiently by supplementing the projection lens model and vector imaging method.