A hybrid proximity effect correction method based on separation of forward-/back-scattering and cumulative distribution function

Efficient and accurate Proximity Effect Correction (PEC) is essential for Electron Beam Lithography (EBL) applications. Here we present an efficient PEC method by combining Cumulative Distribution Function (CDF) and separation of forward and back-scattering. Dose and shape hybrid corrections are used together to further enhance PEC accuracy. Compared to the traditional pixelation algorithms, the proposed method can enhance modeling efficiency by three orders of magnitude, while keeping the edge placement error (EPE) below one nanometer, in our testbench calculations. The proposed method might be useful in large-scale Mask Data Preparation (MDP) and direct-write EBL applications.