Fresnel diffraction by rectangle aperture: a non-approximate integral theorem and aperture pattern correction

A non-approximate integral theorem of Fresnel diffraction by rectangle aperture is proposed. The phase term in the Fresnel diffraction integral is retained exactly, the Fresnel obliquity factor is determined by triangle relation, not approximated by paraxial. It’s applied to DUV wavelength similar size of rectangle aperture. The numerical evaluation of diffraction integral provides intensity distribution. The contour profile and fitting rectangle is determined, the alternative phase shift and pattern correction is introduced. The simulation and resolution enhancement of the near field Fresnel diffraction by rectangle aperture, provides a perspective solution of DUV proximity lithography.

Authors

Institutions

Publication Details

Published
2024-12-10
DOI
https://doi.org/10.1117/12.3052939
Primary Topic
Advancements in Photolithography Techniques
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Fresnel diffraction by rectangle aperture: a non-approximate integral theorem and aperture pattern correction

Kai-Sheng Chen
Advancements in Photolithography Techniques
article

Fresnel diffraction by rectangle aperture: a non-approximate integral theorem and aperture pattern correction

Kai-Sheng Chen
article en

Abstract

A non-approximate integral theorem of Fresnel diffraction by rectangle aperture is proposed. The phase term in the Fresnel diffraction integral is retained exactly, the Fresnel obliquity factor is determined by triangle relation, not approximated by paraxial. It’s applied to DUV wavelength similar size of rectangle aperture. The numerical evaluation of diffraction integral provides intensity distribution. The contour profile and fitting rectangle is determined, the alternative phase shift and pattern correction is introduced. The simulation and resolution enhancement of the near field Fresnel diffraction by rectangle aperture, provides a perspective solution of DUV proximity lithography.

Shanghai Optical Instrument Research Institute (CN)
Openalex Percentile: Top 80%
Advancements in Photolithography Techniques
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.