A methodology for random placement of unit patterns to identify potential design and process optimizations

The main hurdle in developing new IC technology nodes is the absence of high-quality, comprehensive layouts that can thoroughly test process capabilities, design and process interaction. In the initial stage of process development, it's necessary to define process specifications, specify OPC recipes, and establish design rules to confirm layout manufacturability. Each of these crucial tasks requires chip layouts to assess the quality, precision, and completeness of development outcomes. This paper primarily discusses how to utilize layout slicing to assemble a large layout. It involves cutting the hotspot-free design and contour layouts into slices of different sizes, enriching these slices through flipping, and then randomly assembling the enriched slices to form a large layout.

Authors

Institutions

Publication Details

Published
2024-12-10
DOI
https://doi.org/10.1117/12.3054474
Primary Topic
Advancements in Photolithography Techniques
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

A methodology for random placement of unit patterns to identify potential design and process optimizations

Guangjian He, Junyu Lu, Jiayu Li, Yun Wang et al.
Advancements in Photolithography Techniques
article

A methodology for random placement of unit patterns to identify potential design and process optimizations

Guangjian He, Junyu Lu, Jiayu Li, Yun Wang, Yi Tong
article en

Abstract

The main hurdle in developing new IC technology nodes is the absence of high-quality, comprehensive layouts that can thoroughly test process capabilities, design and process interaction. In the initial stage of process development, it's necessary to define process specifications, specify OPC recipes, and establish design rules to confirm layout manufacturability. Each of these crucial tasks requires chip layouts to assess the quality, precision, and completeness of development outcomes. This paper primarily discusses how to utilize layout slicing to assemble a large layout. It involves cutting the hotspot-free design and contour layouts into slices of different sizes, enriching these slices through flipping, and then randomly assembling the enriched slices to form a large layout.

Guangdong Greater Bay Area Institute of Integrated Circuit and System
Openalex Percentile: Top 80%
Advancements in Photolithography Techniques
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.

A methodology for random placement of unit patterns to identify potential design and process optimizations — Guangjian He, Junyu Lu, et al. · (2024) | TGRS Research Map | TGRS