Allocation method of micromirror array for deep ultraviolet illumination system

Source and mask optimization (SMO) is a crucial resolution enhancement technique for 28nm technology node and beyond in lithography. The allocation method of micromirror array (MMA) is the key to produce the freeform illumination source. The generated illumination source is affected by the computation speed and accuracy of the allocation method. In this paper, an allocation method of micromirror array for deep ultraviolet illumination system is proposed. The computation speed of the proposed method is faster than the traditional method. The experimental results show that the computation efficiency of the proposed method has been improved by at least 50%.