Synergistic strain and N-doping for creating physical orientation selectivity in chemical etching of graphene nanoribbons
An innovative synthesis method combining physical stress and nitrogen doping for directional etching of graphene, enabling precise control over GNR edge and width structures with superior ORR activity.
Authors
- Chengqian Huang (ORCID: https://orcid.org/0000-0001-6681-7548)
- Kuibo Yin (ORCID: https://orcid.org/0000-0001-5268-6807)
- Jinlan Wang (ORCID: https://orcid.org/0000-0002-4529-874X)
- Yunqian Dai (ORCID: https://orcid.org/0000-0002-4913-7492)
- Yuansen Zhu
- Xiangyu Meng (ORCID: https://orcid.org/0000-0002-2210-4017)
- Liang Ma (ORCID: https://orcid.org/0000-0002-7295-7667)
- Ying Li (ORCID: https://orcid.org/0000-0002-1487-3350)
- Yueming Sun (ORCID: https://orcid.org/0000-0002-9078-4085)
- Shiming Zhou
Institutions
- Hefei National Center for Physical Sciences at Nanoscale (CN)
- Ministry of Education (BD)
- Southeast University (CN)
Publication Details
- Journal
- Journal of Materials Chemistry A
- Published
- 2024-12-10
- DOI
- https://doi.org/10.1039/d4ta05960c
- Citations
- 1
- Primary Topic
- Graphene research and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.12