High‐Performance Perovskite Flat Panel X‐Ray Imagers via Blade Coating

Perovskite X-ray detectors are recognized as the most promising candidates for low-dose detectors due to their superior performance. However, it is still full of challenging in the fabrication of flat-panel X-ray imagers (FPXIs), primarily due to the absence of large area thick films that exhibit high uniformity and long-term performance stability. A general synthesis route is urgently needed to grow large-scale halide perovskite thick films directly on a pixeled thin-film transistor (TFT) backplane with high uniformity, closing the gap between the great potential of perovskite X-ray detectors and their entry into the market. In this work, an advanced precursor paste suitable for blade coating is developed to enable high-throughput manufacturing of FPXIs. Highly uniform perovskite films with a thickness of 300-micrometers are directly deposited onto pixeled TFT substrates by the blade-coating method using the above paste, which governs a stable dark current and minimal noise of the X-ray detectors. As a result, (BA)₂(MA)₉Pb₁₀I₃₁ perovskite X-ray detectors achieved a high sensitivity of 15200 µC Gy_air ^-1 cm^-2 and a limit of detection (LoD) of 26.8 nGy_air s^-1. Moreover, FPXIs with a spatial resolution of 0.95 lp mm^-1 (0.475 lp pixel^-1) are obtained, which exhibits negligible signal crosstalk and excellent X-ray imaging performance.