Highly stable and conformal Ti–organic thin films from sustainable precursors <i>via</i> atomic/molecular layer deposition towards green energy applications
Thin-film deposition using sustainable precursors is required for various next-generation green energy applications. Here we report two atomic/molecular layer deposition processes for appreciably stable and conformal Ti-organic thin films and TiO<sub>2</sub>:organic superlattices with potential in <i>e.g.</i> battery, photocatalysis and thermoelectric applications. These processes are based on the safe and sustainable titanium isopropoxide as the titanium precursor.
Authors
- Anish Philip (ORCID: https://orcid.org/0000-0001-9978-210X)
- Eero Haimi (ORCID: https://orcid.org/0000-0002-2262-9147)
- Maarit Karppinen (ORCID: https://orcid.org/0000-0003-1091-1169)
- Umaid Lone
- Olga Partanen
Institutions
- Aalto University (FI)
Publication Details
- Journal
- Chemical Communications
- Published
- 2024-12-06
- DOI
- https://doi.org/10.1039/d4cc05425c
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00