Characterization and modeling protocol for GaN-on-Si power transistors

Designing a monolithic circuit around a GaN/Si High electron mobility power transistor requires accurate characterization and device modeling. The characterization aims to provide adequate parameters to the transistor model. In particular, the characterization protocol presented in this paper enables to capture a wide range of current, from very low currents (a few hundred picoamperes to a few nanoamperes) when the transistor is off (sub-threshold), to high currents (several hundred milliamperes to a few amperes) when the transistor is on. A special care is given to detecting any drift in the component characteristics which may be caused by the characterization step. A modeling procedure is also presented, to build a SPICE parametric model of the transistor. An $R^{2}$ criterion is used to validate the resulting models.

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Publication Details

Published
2024-11-04
DOI
https://doi.org/10.1109/wipda62103.2024.10773354
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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Characterization and modeling protocol for GaN-on-Si power transistors

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GaN-based semiconductor devices and materials
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Characterization and modeling protocol for GaN-on-Si power transistors

Cyril Buttay, Bruno Allard, A. Soltani, Hassan Maher, Salim Dahmani, Adama Seck Elhadji
article en

Abstract

Designing a monolithic circuit around a GaN/Si High electron mobility power transistor requires accurate characterization and device modeling. The characterization aims to provide adequate parameters to the transistor model. In particular, the characterization protocol presented in this paper enables to capture a wide range of current, from very low currents (a few hundred picoamperes to a few nanoamperes) when the transistor is off (sub-threshold), to high currents (several hundred milliamperes to a few amperes) when the transistor is on. A special care is given to detecting any drift in the component characteristics which may be caused by the characterization step. A modeling procedure is also presented, to build a SPICE parametric model of the transistor. An $R^{2}$ criterion is used to validate the resulting models.

Université Claude Bernard Lyon 1 (FR), Centre National de la Recherche Scientifique (FR), Université de Sherbrooke (CA), Institut National des Sciences Appliquées de Lyon (FR)
Affordable and clean energy
Openalex Percentile: Top 86%
GaN-based semiconductor devices and materials
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