Thickness dependence of the mechanical properties of piezoelectric high-Q <sub>m</sub> nanomechanical resonators made from aluminium nitride

Abstract Nanomechanical resonators with high quality factors ( Q m ) enable mechanics-based quantum technologies, in particular quantum sensing and quantum transduction. High- Q m nanomechanical resonators in the kHz to MHz frequency range can be realized in tensile-strained thin films that allow the use of dissipation dilution techniques to drastically increase Q m . In our work, we study the material properties of tensile-strained piezoelectric films made from aluminium nitride (AlN). We characterize crystalline AlN films with a thickness ranging from 45 nm to 295 nm, which are directly grown on Si(111) by metal–organic vapour-phase epitaxy. We report on the crystal quality and surface roughness, the piezoelectric response, and the residual and released stress of the AlN thin films. Importantly, we determine the intrinsic quality factor of the films at room temperature in high vacuum. We fabricate and characterize AlN nanomechanical resonators that exploit dissipation dilution to enhance the intrinsic quality factor by utilizing the tensile strain in the film. We find that AlN nanomechanical resonators below 200 nm thickness exhibit the highest <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:msub> <mml:mi>Q</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> <mml:mo>×</mml:mo> <mml:msub> <mml:mi>f</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> </mml:mrow> </mml:math> -product, on the order of 10 12 Hz. We discuss possible strategies to optimize the material growth that should lead to devices that reach even higher <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:msub> <mml:mi>Q</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> <mml:mo>×</mml:mo> <mml:msub> <mml:mi>f</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> </mml:mrow> </mml:math> -products. This will pave the way for future advancements of optoelectromechanical quantum devices made from tensile-strained piezoelectric AlN.

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Publication Details

Journal
Materials for Quantum Technology
Published
2024-12-01
DOI
https://doi.org/10.1088/2633-4356/ad9b64
Citations
2
Primary Topic
Mechanical and Optical Resonators
Type
article
Field-Weighted Citation Impact
0.68

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article

Thickness dependence of the mechanical properties of piezoelectric high-Q m nanomechanical resonators made from aluminium nitride

Anastasiia Ciers, Alexander Jung, Joachim Ciers, A. Dadgar et al.
2 citations
Materials for Quantum Technology
Mechanical and Optical Resonators
0.68
article

Thickness dependence of the mechanical properties of piezoelectric high-Q m nanomechanical resonators made from aluminium nitride

Anastasiia Ciers, Alexander Jung, Joachim Ciers, A. Dadgar, Witlef Wieczorek, A. Strittmatter, Hannes Pfeifer, Laurentius Radit Nindito, Juergen Blaesing
article en
2 citations

Abstract

Abstract Nanomechanical resonators with high quality factors ( Q m ) enable mechanics-based quantum technologies, in particular quantum sensing and quantum transduction. High- Q m nanomechanical resonators in the kHz to MHz frequency range can be realized in tensile-strained thin films that allow the use of dissipation dilution techniques to drastically increase Q m . In our work, we study the material properties of tensile-strained piezoelectric films made from aluminium nitride (AlN). We characterize crystalline AlN films with a thickness ranging from 45 nm to 295 nm, which are directly grown on Si(111) by metal–organic vapour-phase epitaxy. We report on the crystal quality and surface roughness, the piezoelectric response, and the residual and released stress of the AlN thin films. Importantly, we determine the intrinsic quality factor of the films at room temperature in high vacuum. We fabricate and characterize AlN nanomechanical resonators that exploit dissipation dilution to enhance the intrinsic quality factor by utilizing the tensile strain in the film. We find that AlN nanomechanical resonators below 200 nm thickness exhibit the highest <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:msub> <mml:mi>Q</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> <mml:mo>×</mml:mo> <mml:msub> <mml:mi>f</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> </mml:mrow> </mml:math> -product, on the order of 10 12 Hz. We discuss possible strategies to optimize the material growth that should lead to devices that reach even higher <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:msub> <mml:mi>Q</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> <mml:mo>×</mml:mo> <mml:msub> <mml:mi>f</mml:mi> <mml:mtext>m</mml:mtext> </mml:msub> </mml:mrow> </mml:math> -products. This will pave the way for future advancements of optoelectromechanical quantum devices made from tensile-strained piezoelectric AlN.

Materials for Quantum TechnologyVol. 4(4)
Chalmers University of Technology (SE), Otto-von-Guericke-Universität Magdeburg (DE)
European Commission, Knut och Alice Wallenbergs Stiftelse, Vetenskapsrådet, Wallenberg Center for Quantum Technology, Chalmers University of Technology, HORIZON EUROPE Marie Sklodowska-Curie Actions
Openalex Percentile: Top 29%
Mechanical and Optical Resonators
0.68
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