A warpage-free Si <sub>3</sub>N <sub>4</sub> slurry strategy for vat photopolymerization

Si<sub>3</sub>N<sub>4</sub> ceramics are promising wave-transparent materials with excellent mechanical and dielectric properties. Vat photopolymerization (VPP) 3D printing provides a strategy for preparing ceramics with controllable complex structures. However, the difficulty in solidifying the slurry due to partial ultraviolet (UV) light absorption and high refractive index by the Si<sub>3</sub>N<sub>4</sub> particles during the VPP process severely hampers the molding of Si<sub>3</sub>N<sub>4</sub> ceramics. Higher laser power has to be used to increase the curing depth, which generates large internal stresses and leads to the warping of the samples. This paper presents a method to solve the warpage problem during VPP-3D printing using tributyl citrate as a plasticizer. The plasticizer can weaken the force between polymer molecular chains and reduce the internal stress of the green body. The warpage decreases gradually with the increase of tributyl citrate content, and the warpage decreases to 0 when the plasticizer content reaches 30 wt.% at high laser powers from 600 mW to 750 mW. Samples with different layer thicknesses were printed and the optimum thickness of 40 μm was obtained, at which the sintered Si<sub>3</sub>N<sub>4</sub> samples possess a unique combination of mechanical properties, including a bending strength of 338.29±12.08 MPa, a fracture toughness of 6.94±0.11 MPa·m<sup>1/2</sup> for the loading direction perpendicular and 5.37±0.99 MPa·m<sup>1/2</sup> for the loading direction parallel to the build surface, respectively. The dielectric constant of all the samples is maintained in the range of 5.462 to 6.414. This work is expected to guide vat photopolymerization and the preparation of complex Si<sub>3</sub>N<sub>4</sub> ceramic components.

Authors

Publication Details

Journal
Journal of Advanced Ceramics
Published
2024-12-06
DOI
https://doi.org/10.26599/jac.2024.9221016
Citations
10
Primary Topic
Photopolymerization techniques and applications
Type
article
Field-Weighted Citation Impact
2.50
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article

A warpage-free Si 3N 4 slurry strategy for vat photopolymerization

Lei Shi, Bin Li, Chi Huang, L. Zheng et al.
10 citations
Journal of Advanced Ceramics
Photopolymerization techniques and applications
2.50
article

A warpage-free Si 3N 4 slurry strategy for vat photopolymerization

Lei Shi, Bin Li, Chi Huang, L. Zheng, Zhilin Tian
article en
10 citations

Abstract

Si<sub>3</sub>N<sub>4</sub> ceramics are promising wave-transparent materials with excellent mechanical and dielectric properties. Vat photopolymerization (VPP) 3D printing provides a strategy for preparing ceramics with controllable complex structures. However, the difficulty in solidifying the slurry due to partial ultraviolet (UV) light absorption and high refractive index by the Si<sub>3</sub>N<sub>4</sub> particles during the VPP process severely hampers the molding of Si<sub>3</sub>N<sub>4</sub> ceramics. Higher laser power has to be used to increase the curing depth, which generates large internal stresses and leads to the warping of the samples. This paper presents a method to solve the warpage problem during VPP-3D printing using tributyl citrate as a plasticizer. The plasticizer can weaken the force between polymer molecular chains and reduce the internal stress of the green body. The warpage decreases gradually with the increase of tributyl citrate content, and the warpage decreases to 0 when the plasticizer content reaches 30 wt.% at high laser powers from 600 mW to 750 mW. Samples with different layer thicknesses were printed and the optimum thickness of 40 μm was obtained, at which the sintered Si<sub>3</sub>N<sub>4</sub> samples possess a unique combination of mechanical properties, including a bending strength of 338.29±12.08 MPa, a fracture toughness of 6.94±0.11 MPa·m<sup>1/2</sup> for the loading direction perpendicular and 5.37±0.99 MPa·m<sup>1/2</sup> for the loading direction parallel to the build surface, respectively. The dielectric constant of all the samples is maintained in the range of 5.462 to 6.414. This work is expected to guide vat photopolymerization and the preparation of complex Si<sub>3</sub>N<sub>4</sub> ceramic components.

Journal of Advanced CeramicsVol. 14(1)
Openalex Percentile: Top 10%
Photopolymerization techniques and applications
2.50
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A warpage-free Si <sub>3</sub>N <sub>4</sub> slurry strategy for vat photopolymerization — Lei Shi, Bin Li, et al. · Journal of Advanced Ceramics (2024) | TGRS Research Map | TGRS