An in-depth Analysis of the Physical Characteristics of TiO2–CuO Films Fabricated via Spray Pyrolysis

A composite film of TiO2–CuO synthesized by spray pyrolysis is deposited onto a silicon (Si) substrate and subjected to comprehensive characterization using diverse analytical techniques. X-ray diffraction (XRD) revealed the presence of an anatase phase of TiO2 and a monoclinic phase of CuO, with the highest diffraction occurring on the (101) plane. Raman spectra also depict anatase phase of TiO2. The scanning electron microscope (SEM) image reveals a porous and rough morphology whereas EDX depicts the inclusion of CuO. While UV–Visible diffused reflectance indicates a direct band gap of 3.21 eV. Similarly, photoluminescence (PL) studies reveal a significant reduction in intensity within the UV and blue regions as compared to the yellow region. Likewise, the ideality factor (n) and barrier height (Φb), which are diode parameters are computed based on the I–V characteristics. These findings suggest that the TiO2–CuO film holds potential for applications in the manufacturing of optoelectronic devices.